SCOPUS 정보 검색 플랫폼

Surface Science

Volumn 605, Issue 3-4, 2011, Pages 289-295

Variable termination of MnSi/Si(111)√3× √3 films and its effect on surface properties

(5) Azatyan, S G a Utas, O A a Denisov, N V a Zotov, A V a,b,c Saranin, A A a,b

a INSTITUTE OF AUTOMATION AND CONTROL PROCESSES (Russian Federation)

b FAR EASTERN FEDERAL UNIVERSITY (Russian Federation)

c VLADIVOSTOK STATE UNIVERSITY OF ECONOMICS AND SERVICE (Russian Federation)

Author keywords

Atom solid interactions; Manganese; Morphology; Roughness; Scanning tunneling microscopy (STM); Silicon; Surface structure; Topography

Indexed keywords

ATOM-SOLID INTERACTION; FOUR-ORDER; GROWTH CONDITIONS; MNSI FILMS; QUADRUPLE LAYER; ROUGHNESS; SCANNING TUNNELING MICROSCOPY (STM); SI (1 1 1); SI LAYER;

ADSORPTION; ATOMS; CRYSTAL ATOMIC STRUCTURE; ECOLOGY; FILM GROWTH; MANGANESE; MANGANESE COMPOUNDS; SCANNING; SCANNING TUNNELING MICROSCOPY; SILICON; SURFACE PROPERTIES; SURFACE ROUGHNESS; TOPOGRAPHY;

SURFACE STRUCTURE;

EID: 78651234409 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2010.10.031 Document Type: Article

Times cited : (15)

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