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Volumn 27, Issue 12, 2010, Pages

Influence of O2 flux on compositions and properties of ITO films deposited at room temperature by direct-current pulse magnetron sputtering

(4) Wang, Hua Lin a Ding, Wan Yu b Liu, Chao Qian b Chai, Wei Ping b

a DALIAN JIAOTONG UNIVERSITY (China)

b Engineering Research Center of Optoelectronic Materials and Devices (China)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL BONDS; CONDUCTIVE FILMS; INDIUM COMPOUNDS; ITO GLASS; MAGNETRON SPUTTERING; SPECTROMETERS; TIN OXIDES;

BONDING STRUCTURE; CRYSTALLINE STRUCTURE; CURRENT PULSE; DIRECT-CURRENT; GLASS SUBSTRATES; INDIUM TIN OXIDE FILMS; PROPERTY; PULSE MAGNETRON SPUTTERING; X RAY DIFFRACTOMETERS; X RAY PHOTOELECTRON SPECTROMETERS;

SUBSTRATES;

EID: 78650973051 PISSN: 0256307X EISSN: 17413540 Source Type: Journal
DOI: 10.1088/0256-307X/27/12/127302 Document Type: Article

Times cited : (6)

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