A high voltage pulse power supply for metal plasma immersion ion implantation and deposition

Review of Scientific Instruments

Volumn 81, Issue 12, 2010, Pages

  Salvadori, M C ^a   Teixeira, F S ^a   Arajo, W W R ^a   Sgubin, L G ^a   Sochugov, N S ^b   Spirin, R E ^b   Brown, I G ^c  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DIAMOND-LIKE CARBON; DLC FILM; DUTY CYCLES; FILM-SUBSTRATE ADHESION; HIGH VOLTAGE PULSERS; HIGH-VOLTAGE PULSE POWER SUPPLY; INTERFACE MIXING; MACROPULSES; METAL PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; MICROPULSES; NEGATIVE PULSE; PEAK CURRENTS; PLASMA IMMERSION ION IMPLANTATION AND DEPOSITION; PULSE WIDTH; SI SUBSTRATES; SUBSTRATE BIAS; VACUUM ARC PLASMA; VACUUM ARCS;

CARBON FILMS; DIAMOND LIKE CARBON FILMS; ELECTRIC POTENTIAL; ION IMPLANTATION; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; VACUUM; VACUUM APPLICATIONS;

ION BEAM ASSISTED DEPOSITION;

EID: 78650894371     PISSN: 00346748     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3518969     Document Type: Article

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