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Volumn 1, Issue 2, 2010, Pages 26-30

3D CFD for chemical transport profiles in a rotating disk CVD reactor

Author keywords

3D CFD; buoyancy flow; centrifuge flow; Fluent; RDCVD

Indexed keywords

BUOYANCY; CENTRIFUGES; COMPUTATIONAL FLUID DYNAMICS; HEAT TRANSFER; ROTATING DISKS; VORTEX FLOW;

EID: 78650658788     PISSN: None     EISSN: 20926731     Source Type: Journal    
DOI: 10.1007/3DRes.02(2010)05     Document Type: Review
Times cited : (9)

References (10)
  • 4
    • 0038159753 scopus 로고
    • Surface chemical kinetics and gasphase diffusion in the germanium-iodine reaction
    • Olander DR (1967) Surface chemical kinetics and gasphase diffusion in the germanium-iodine reaction, Ind. Eng Chem Fundam. 6: 178-188.
    • (1967) Ind. Eng Chem Fundam. , vol.6 , pp. 178-188
    • Olander, D.R.1
  • 5
    • 0026170355 scopus 로고
    • Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapor deposition reactor
    • Breiland WG, Evans GH (1991) Design and verification of nearly ideal flow and heat transfer in a rotating disk chemical vapor deposition reactor, J. Electrochem. Soc. 138: 1806-1816.
    • (1991) J. Electrochem. Soc. , vol.138 , pp. 1806-1816
    • Breiland, W.G.1    Evans, G.H.2
  • 6
    • 0023453832 scopus 로고
    • A numerical model of the flow and heat transfer in a rotating disk chemical vapor deposition reactor
    • Evand G, Greif R (1987) A numerical model of the flow and heat transfer in a rotating disk chemical vapor deposition reactor, J Heat Transfer. 109: 928-937.
    • (1987) J Heat Transfer , vol.109 , pp. 928-937
    • Evand, G.1    Greif, R.2
  • 8
    • 33644864728 scopus 로고    scopus 로고
    • Reactor design optimization based on 3D modeling of nitrides deposition in MOCVD vertical rotating disc reactors
    • Mitrovi B, Parekh A, Ramer J, Merai V, Armour EA, Kadinski L, Gurary A (2006) Reactor design optimization based on 3D modeling of nitrides deposition in MOCVD vertical rotating disc reactors, J. Crystal Growth. 289: 708-714.
    • (2006) J. Crystal Growth. , vol.289 , pp. 708-714
    • Mitrovi, B.1    Parekh, A.2    Ramer, J.3    Merai, V.4    Armour, E.A.5    Kadinski, L.6    Gurary, A.7
  • 9
    • 0031101822 scopus 로고    scopus 로고
    • MOCVD technology for semiconductors
    • Thompson AG (1997) MOCVD technology for semiconductors, Materials Letters. 30: 255-263.
    • (1997) Materials Letters , vol.30 , pp. 255-263
    • Thompson, A.G.1
  • 10
    • 43949143151 scopus 로고    scopus 로고
    • 3D CFD analysis of the hydrogen releases and dispersion around storage facilities
    • Hwang JW, Yoon DY, Choi KH, Kim Y, Kim LH (2008) 3D CFD analysis of the hydrogen releases and dispersion around storage facilities, Korean J. Chem Eng. 25: 217-222.
    • (2008) Korean J. Chem Eng. , vol.25 , pp. 217-222
    • Hwang, J.W.1    Yoon, D.Y.2    Choi, K.H.3    Kim, Y.4    Kim, L.H.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.