Structural and morphological characterization of silicophosphate thin films containing Nd3+ ions

Physics and Chemistry of Glasses: European Journal of Glass Science and Technology Part B

Volumn 51, Issue 6, 2010, Pages 309-317

  Elisa, M ^a   Vasiliu, I C ^a   Sava, B A ^b   Nastase, F ^c   Nastase, C ^c   Volceanov, A ^d   Dima, V ^d   Stoleriu, S ^d   Eftimie, M ^d  

^a NATIONAL INSTITUTE OF RESEARCH AND DEVELOPMENT FOR OPTOELECTRONICS INOE 2000   (Romania)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c UNIVERSITY OF BUCHAREST   (Romania)

^d UNIVERSITY POLITEHNICA OF BUCHAREST   (Romania)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; FT-IR SPECTRUM; MORPHOLOGICAL CHARACTERIZATION; MORPHOLOGICAL INFORMATION; ND-DOPED; O-H BOND; OPTICAL PHONONS; PRECURSOR SOLS; RAMAN SPECTRA; RANDOMLY DISTRIBUTED; ROOM TEMPERATURE; ROTATION SPEED; SEM; SOL-GEL THIN FILMS; SOLGEL FILMS; SPINNING RATE; SPINNING SPEED; TETRAETHOXYSILANES; TRIETHYLPHOSPHATE; VIBRATION MODES;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; CRYSTAL ATOMIC STRUCTURE; FOURIER TRANSFORMS; GELS; NEODYMIUM; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON COMPOUNDS; SOL-GEL PROCESS; SOL-GELS; SOLS; THIN FILMS; VAPOR DEPOSITION;

FILM PREPARATION;

EID: 78650626619     PISSN: 00319090     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

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