SiO x -P 2O 5 films-promising components in photonic structure

Optical and Quantum Electronics

Volumn 39, Issue 4-6, 2007, Pages 511-521

  Vasiliu, I ^a   Gartner, M ^b   Anastasescu, M ^b   Todan, L ^b   Predoana, L ^b   Elisa, M ^a   Grigorescu, C ^a   Negrila, C ^c   Logofatu, C ^c   Enculescu, M ^c   Moldovan, A ^d   Pavelescu, G ^a   Zaharescu, M ^b  

^a NATIONAL INSTITUTE OF RESEARCH AND DEVELOPMENT FOR OPTOELECTRONICS INOE 2000   (Romania)

^b INSTITUTE OF PHYSICAL CHEMISTRY   (Romania)

^c Box MG 7   (Romania)

^d NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

AFM; Ellipsometry; Phosphorous silicate films; Sol gel; UV VIS; XPS

Indexed keywords

PHOSPHOROUS SILICATE FILMS; PHOTONIC APPLICATIONS; PHOTONIC STRUCTURE; TRANSMISSION SPECTRA;

ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; PERIODIC STRUCTURES; SOL-GEL PROCESS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

PHOTONIC CRYSTALS;

EID: 36048985997     PISSN: 03068919     EISSN: 1572817X     Source Type: Journal    
DOI: 10.1007/s11082-007-9096-2     Document Type: Article

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