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Applied Physics A: Materials Science and Processing

Volumn 101, Issue 4, 2010, Pages 633-638

Cathodoluminescence degradation of PLD thin films

(7) Swart, H C a Coetsee, E a Terblans, J J a Ntwaeaborwa, O M a Nsimama, P D a Dejene, F B a Dolo, J J a

a UNIVERSITY OF THE FREE STATE (South Africa)

Author keywords

[No Author keywords available]

Indexed keywords

AGGLOMERATED NANOPARTICLES; BACKGROUND GAS; BASE PRESSURE; CATHODOLUMINESCENCE (CL); ELECTRON BOMBARDMENTS; ELECTRON DEGRADATION; ELECTRON STIMULATED SURFACE CHEMICAL REACTIONS; GAS SPECIES; INFRASTRUCTURE APPLICATIONS; LASER FLUENCES; LIGHT INTENSITY; LOW-VOLTAGE FIELD EMISSION; LUMINOUS EFFICIENCY; OXIDE LAYER; OXYGEN PRESSURE; PHOSPHOR THIN FILMS; PROCESS PARAMETERS; SUBSTRATE TEMPERATURE; SURFACE CHEMICAL COMPOSITION;

ATOMIC FORCE MICROSCOPY; CATHODOLUMINESCENCE; CERIUM; CERIUM COMPOUNDS; DEGRADATION; DEPOSITION; ELECTRONS; EUROPIUM; FIELD EMISSION; FIELD EMISSION DISPLAYS; GADOLINIUM; LIGHT EMISSION; OXYGEN; PULSED LASER DEPOSITION; PULSED LASERS; SILICON COMPOUNDS; SURFACE REACTIONS; SURFACE ROUGHNESS; TERBIUM; THIN FILMS; VAPOR DEPOSITION; X RAY PHOTOELECTRON SPECTROSCOPY;

AUGER ELECTRON SPECTROSCOPY;

EID: 78650626092 PISSN: 09478396 EISSN: 14320630 Source Type: Journal
DOI: 10.1007/s00339-010-5915-6 Document Type: Article

Times cited : (21)

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