ZnS thin films grown on Si(100) by XeCl pulsed laser ablation

Applied Surface Science

Volumn 177, Issue 1-2, 2001, Pages 73-77

  Hillie, K T ^a   Curren, C ^b   Swart, H C ^a  

^a UNIVERSITY OF THE FREE STATE   (South Africa)

^b NATIONAL ACCELERATOR CENTRE   (South Africa)

Author keywords

Auger electron spectroscopy; Pulsed laser deposition; Zn based phosphors

Indexed keywords

AUGER ELECTRON SPECTROSCOPY; CATHODOLUMINESCENCE; COMPOSITION EFFECTS; FILM GROWTH; GAS LASERS; LASER ABLATION; PHOSPHORS; PULSED LASER DEPOSITION; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SEMICONDUCTING SILICON; SEMICONDUCTING ZINC COMPOUNDS; SUBSTRATES; SURFACE STRUCTURE; THIN FILMS; VACUUM APPLICATIONS; X RAY DIFFRACTION ANALYSIS;

ULTRA HIGH VACUUM AUGER ELECTRON SPECTROSCOPY;

SEMICONDUCTING FILMS;

EID: 0035371489     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0169-4332(01)00206-9     Document Type: Article

References (22)

1. Holloway P.H., Sebastian J.S., Trottier T., C Swart H., Peterson R.O. Solid State Technol. 8:1995;47.
2. Baptist R., Bachelet F., Constancias C. J. Vac. Sci. Technol. B. 15(2):1997;385.
3. Hase T., Kano T., Nakazawa E., Yamamoto H. Adv. Electron. Electron Phys. 79:1990;271.
4. Greengerg B., Zwicker W.K., Cadoff I. Thin Solid Films. 141:1986;89.
5. Cook J.W. Jr., Eason D.B., Vaudo R.P., Schetzina J.F. J. Vac. Sci. Technol. B10(2):1992;901.
6. Ihanus J., Ritala M., Leskeläand M., Prohaska T., Resch R., Friedbacher G., Grasserbauer M. Appl. Surf. Sci. 120:1997;43.
7. Wang C.W., Sheu T.J., Su Y.K., Yokoyama M. Appl. Surf. Sci. 113/114:1997;709.
8. Valkonen M.P., Lindroos S., Resch R., Leskelä M., Friedbacher G., Grasserbauer M. Appl. Surf. Sci. 136:1998;131.
9. Prete P., Lovergine N., Masser M., Zanotti-Fregonora C., Mancini A.M. J. Crystal Growth. 204:1999;29.
10. J.T. Cheung, In: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 1.
11. K.L. Seanger, In: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 581.
12. Horwitz J.S., Chrisey D.B., Stroud R.M., Carter A.C., Kim J., Chang W., Pond J.M., Kirchoefer S.W., Osofsky M.S., Koller D. Appl. Surf. Sci. 127-129:1998;507.
13. Krebs H.U. Int. J. Non-Equilib. Process. 10:1997;3.
14. A. Gupta, In: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 265.
15. Setzer S.D., Moldovan M., Yu Z., Myers T.H., Giles N.C., Halliburton L.E. Appl. Phys. Lett. 70(17):1997;2274.
16. Cheung J.T., Madden J. J. Vac. Sci. Technol. B5(3):1987;705.
17. Schenck P.K., Vaudin M.D., Bonnell D.W., Hastie J.W., Paul A.J. Appl. Surf. Sci. 127-129:1998;655.
18. Geer J.A., Tabat M.D. J. Vac. Sci. Technol. A13(3):1995;1175.
19. Nel J.M., Hillie K.T., Demanet C.M., Auret F.D., Gaigher H.L. Appl. Surf. Sci. 134:1998;22.
20. D.B. Geohegan, In: D.B. Chrisey, G.K. Hubler (Eds.), Pulsed Laser Deposition of Thin Films, Wiley, New York, 1994, p. 115.
21. Strum K., Fähler S., Krebs H.U. Appl. Surf. Sci. 154/155:2000;462.
22. Shen W.P., Kwok H.S. Appl. Phys. Lett. 65(17):1994;2162.