Growth characterization of vertically aligned carbon nanofibers on top of TiN buffer layer for nanoelectromechanical devices

Procedia Engineering

Volumn 5, Issue , 2010, Pages 1115-1118

  Ghavanini, Farzan A ^a   Damian, Maria E L ^a   Rafieian, Damon ^a   Lundgren, Per ^a  

^a CHALMERS UNIVERSITY OF TECHNOLOGY   (Sweden)

Author keywords

Growth; Plasma enhanced CVD; Titanium nitride; VACNF; Vertucally aligned carbon nanojiber

Indexed keywords

CATALYSTS; GROWTH (MATERIALS); NANOFIBERS; NICKEL; PLASMA CVD; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; TITANIUM COMPOUNDS; TITANIUM NITRIDE;

COLLOIDAL LITHOGRAPHY; CRYSTALLOGRAPHIC ORIENTATIONS; GROWTH CHARACTERIZATION; GROWTH-MODE TRANSITION; NANOELECTROMECHANICAL DEVICES; VACNF; VERTICALLY ALIGNED CARBON NANOFIBERS; VERTUCALLY ALIGNED CARBON NANOJIBER;

CARBON NANOFIBERS;

EID: 78650625268     PISSN: None     EISSN: 18777058     Source Type: Conference Proceeding    
DOI: 10.1016/j.proeng.2010.09.306     Document Type: Conference Paper

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