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Electrochimica Acta

Volumn 56, Issue 3, 2011, Pages 1329-1336

In-situ optical emission spectrometry during galvanostatic aluminum anodising

(4) Mercier, D a Van Overmeere, Q a Santoro, R a Proost, J a

a UNIVERSITÉ CATHOLIQUE DE LOUVAIN (Belgium)

Author keywords

Aluminum anodising; Dissolution kinetics; Film formation efficiency; In situ emission spectrometry

Indexed keywords

AL THIN FILMS; AL-CONCENTRATION; ANODIC OXIDES; ANODISING; DECONVOLUTION ALGORITHM; DENSITY DEPENDENCE; DISSOLUTION KINETICS; DISSOLUTION RATES; ELECTROCHEMICAL FLOW CELLS; FILM FORMATION EFFICIENCY; FILM FORMATIONS; GALVANOSTATICS; ICP/OES; IN-SITU; INDUCTIVELY COUPLED PLASMA SPECTROMETERS; KINETIC REGIME; LINEAR VARIATION; MORPHOLOGICAL CHANGES; MORPHOLOGICAL TRANSITIONS; ON-LINE DETECTION; OPTICAL EMISSION SPECTROMETRY; OXIDE FORMATION; OXIDE GROWTH; PORE FORMATION; POROUS OXIDES; SULPHURIC ACIDS; TIME OFFSETS;

ALUMINUM; DECONVOLUTION; ELECTROMAGNETIC INDUCTION; FILM GROWTH; GROWTH KINETICS; INDUCTIVELY COUPLED PLASMA; LIGHT EMISSION; OPTICAL EMISSION SPECTROSCOPY; OPTICAL GLASS; SPECTROMETRY; SULFURIC ACID;

DISSOLUTION;

EID: 78650514600 PISSN: 00134686 EISSN: None Source Type: Journal
DOI: 10.1016/j.electacta.2010.10.092 Document Type: Article

Times cited : (35)

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