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Volumn 97, Issue 23, 2010, Pages

Nanoscale investigations of shift of individual interfaces in temperature induced processes of Ni-Si system by secondary neutral mass spectrometry

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SI; LAYERED SYSTEMS; NANO SCALE; NANOCRYSTALLINE NI; NANOSCALE RESOLUTIONS; NI-SI SYSTEM; PROFILOMETERS; SECONDARY NEUTRAL MASS SPECTROMETRY; TEMPERATURE-INDUCED; THIN FILM SYSTEMS;

EID: 78650357267     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3524491     Document Type: Article
Times cited : (16)

References (16)
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  • 7
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  • 16
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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.