Frequency analysis of maskless lithography system for generation of continuous phase patterns with homogeneous structure depth

Optical Engineering

Volumn 47, Issue 2, 2008, Pages

  Glasenapp, Carsten ^a   Zappe, Hans ^a  

^a UNIVERSITY OF FREIBURG   (Germany)

Author keywords

Diffractive optical elements; Fourier transforms; Lithography; Optical systems

Indexed keywords

DIFFRACTIVE OPTICAL ELEMENTS; FOURIER TRANSFORMS; LIQUID CRYSTAL DISPLAYS; METADATA; OPTICAL SYSTEMS; PHOTORESISTS;

CONTINUOUS PHASE; EXPOSURE SYSTEM; FREQUENCY ANALYSIS; HOMOGENEOUS STRUCTURE; MASK-LESS LITHOGRAPHY; REFLECTIVE LIQUID CRYSTAL DISPLAYS; SPATIAL FREQUENCY; SPATIAL FREQUENCY ANALYSIS;

LITHOGRAPHY;

EID: 78650319069     PISSN: 00913286     EISSN: 15602303     Source Type: Journal    
DOI: 10.1117/1.2870103     Document Type: Article

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