Sub-micrometer dropwise condensation under superheated and rarefied vapor condition

Langmuir

Volumn 26, Issue 22, 2010, Pages 17100-17110

  Anand, Sushant ^a   Son, Sang Young ^a  

^a University of Cincinnati   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CONDENSATION PROCESS; DROPLET GROWTH; DROPLET SURFACES; DROPWISE CONDENSATION; ENVIRONMENTAL SCANNING ELECTRON MICROSCOPY; EXPERIMENTAL APPROACHES; EXPERIMENTAL OBSERVATION; FUNCTION OF TIME; INTERFACIAL MASS TRANSPORT; LOW PRESSURES; NON-CONDENSABLE GAS; PHASE CHANGE; SILICON SURFACES; SINGLE DROPLET; SPATIAL RESOLUTION; STATIC CONTACT ANGLE; SUBMICROMETERS; SUPERHEATED VAPOR; THEORETICAL MODELS; THERMODYNAMIC CONDITIONS; TIME INTERVAL; TIME-SCALES; WET SURFACES;

COALESCENCE; CONDENSATION; CONTACT ANGLE; SCANNING ELECTRON MICROSCOPY; SURFACE PROPERTIES; VAPORS;

DROP FORMATION;

ARTICLE; HEAT; KINETICS; METHODOLOGY; MICROTECHNOLOGY; PHASE TRANSITION; PRESSURE; SURFACE PROPERTY; THEORETICAL MODEL; VOLATILIZATION;

HOT TEMPERATURE; KINETICS; MICROTECHNOLOGY; MODELS, THEORETICAL; PHASE TRANSITION; PRESSURE; SURFACE PROPERTIES; VOLATILIZATION;

EID: 78650312820     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la102642r     Document Type: Article

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