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Volumn 22, Issue 47, 2010, Pages 5374-5377

Extrinsic corrugation-assisted mechanical exfoliation of monolayer graphene

(7) Pang, Shuping a Englert, Jan M b Tsao, Hoi Nok a Hernandez, Yenny a Hirsch, Andreas b Feng, Xinliang a Müllen, Klaus a

a MAX PLANCK INSTITUTE FOR POLYMER RESEARCH (Germany)

b Inst of Adv Mat and Processes (Zentralinstitut fur Neue Materialien und Prozesstechnik ZMP) (Germany)

Author keywords

exfoliation; graphene; plasma etching; surface chemistry; surface patterning

Indexed keywords

GRAPHENE; MONOLAYERS; PLASMA ETCHING; SURFACE CHEMISTRY;

EXFOLIATION; MECHANICAL EXFOLIATION; SILICON SUBSTRATES; SURFACE PATTERNING;

SUBSTRATES;

EID: 78650267255 PISSN: 09359648 EISSN: 15214095 Source Type: Journal
DOI: 10.1002/adma.201002872 Document Type: Article

Times cited : (57)

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