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Volumn 295, Issue 1, 2010, Pages 77-80

Preparation of self-organized porous polymer masks for si dry etching

Author keywords

Porous polymer mask; Self organization; Silicon dry etching

Indexed keywords

CONDENSED WATER; HONEYCOMB-PATTERNED FILM; MICROPORES; POROUS POLYMERS; SELF-ORGANIZATIONS; SELF-ORGANIZED; SI SUBSTRATES;

EID: 78650095267     PISSN: 10221360     EISSN: 15213900     Source Type: Journal    
DOI: 10.1002/masy.200900067     Document Type: Conference Paper
Times cited : (2)

References (22)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.