Pilot line processing of 18.6% efficient rear surface passivated large area solar cells

Conference Record of the IEEE Photovoltaic Specialists Conference

Volumn , Issue , 2010, Pages 1014-1018

  Wolf, Andreas ^a   Wotke, Edgar A ^a   Walczak, Alexandra ^a   Mack, Sebastian ^a   Bitnar, Bernd ^b   Koch, Christian ^b   Preu, Ralf ^a   Biro, Daniel ^a  

^a FRAUNHOFER INSTITUTE FOR SOLAR ENERGY SYSTEMS ISE   (Germany)

^b SolarWorld Innovations GmbH   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

A-THERMAL; BORON-DOPED; CZOCHRALSKI SILICON WAFERS; FILL FACTOR; FRONT END; INDUSTRIAL FABRICATION; INDUSTRIAL PRODUCTION; INDUSTRIAL PRODUCTION LINES; INNOVATIVE APPROACHES; LARGE-AREA SOLAR CELLS; PILOT LINE; REAR SURFACES; TEST MODULES; THERMAL OXIDATION;

BORON; CONVERSION EFFICIENCY; FABRICATION; INDUSTRY; OPEN CIRCUIT VOLTAGE; PASSIVATION; PHOTOVOLTAIC EFFECTS; SEMICONDUCTING SILICON COMPOUNDS; SILICON NITRIDE; SOLAR CELLS;

SILICON WAFERS;

EID: 78650085457     PISSN: 01608371     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/PVSC.2010.5614616     Document Type: Conference Paper

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