Low temperature, atmospheric pressure, direct current microplasma jet operated in air, nitrogen and oxygen

European Physical Journal D

Volumn 60, Issue 3, 2010, Pages 517-522

  Mohamed, A A H ^a,b   Kolb, J F ^c   Schoenbach, K H ^c  

^a TAIBAH UNIVERSITY   (Saudi Arabia)

^b Beni Suef University   (Egypt)

^c OLD DOMINION UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINA; ALUMINUM OXIDE; ATMOSPHERIC PRESSURE; CATHODES; ELECTRIC DISCHARGES; FLOW OF GASES; GASES; METAMATERIALS; MOLECULAR OXYGEN; NITROGEN; NITROGEN PLASMA; PLASMA DEVICES; PLASMA JETS; SURFACE TREATMENT;

CONTAMINATED AREAS; DISCHARGE CHANNEL; DISCHARGE CURRENTS; MICRO-PLASMA JET; MICROHOLLOW CATHODE DISCHARGES; MICROHOLLOW CATHODES; MOLYBDENUM ELECTRODES; SUSTAINING VOLTAGE;

ATMOSPHERIC TEMPERATURE;

EID: 78649832547     PISSN: 14346060     EISSN: 14346079     Source Type: Journal    
DOI: 10.1140/epjd/e2010-00220-7     Document Type: Article

References (34)

1. Nonequilibrium Atmospheric Pressure Air Plasmas, edited by K. Becker, U. Kogelschatz, K.H. Schoenbach, R. Barker (Institute of Physics Publishing, Bristol and Philadelphia, 2005), Chap. 10
2. G. Lloyd G. Friedman S. Jafri G. Schultz A. Fridman K. Harding 2009 Plasma Processes Polym. 7 194 10.1002/ppap.200900097
3. M.G. Kong G. Kroesen G. Morfill T. Nosenko T. Shimizu J. van Dijk J.L. Zimmermann 2009 New J. Phys. 11 1 10.1088/1367-2630/11/11/115012
4. G. Daeschlein T. van Woedtke E. Kindel R. Brandenburg K.-D. Weltmann M. Jünger 2009 Plasma Processes Polym. 7 224 10.1002/ppap.200900059
5. J. Choi A.-A.H. Mohamed S.K. Kang K.C. Woo K.T. Kim J.K. Lee 2010 Plasma Processes Polym. 7 258 10.1002/ppap.200900079
6. X.T. Deng J.J. Shi M.G. Kong 2007 J. Appl. Phys. 101 074701 10.1063/1.2717576 2007JAP...101g4701D
7. H.W. Lee S.H. Nam A.-A.H. Mohamed G.C. Kim J.K. Lee 2009 Plasma Processes Polym. 7 274 10.1002/ppap.200900083
8. H. Yasuda T. Miura H. Kurita K. Takashima A. Mizuno 2010 Plasma Processes Polym. 7 301 10.1002/ppap.200900088
9. G. Fridman G. Friedman A. Gutsol A.B. Shekhter V.N. Vasilets A. Fridman 2008 Plasma Processes Polym. 5 503 10.1002/ppap.200700154
10. D. Harbec J.-L. Meunier L. Guo J. Jureidini 2007 Carbon 45 2054 10.1016/j.carbon.2007.05.025
11. B.A. Niemira J. Sites 2008 J. Food Protection 71 1357
12. A. Koinuma H. Ohkubo T. Hashimoto K. Inomata T. Sshiraishi A. Miyanaga S. Hayashi 1992 Appl. Phys. Lett. 60 816 10.1063/1.106527 1992ApPhL..60..816K
13. G.G. Bondarenko V.V. Andreev V.M. Maslovsky A.A. Stolyarov V.E. Drach 2003 Thin Solid Films 427 377 10.1016/S0040-6090(02)01146-X 2003TSF...427..377B
14. E. Stoffels A.J. Flikweert W.W. Stoffels G.M.W. Kroesen 2002 Plasma Source. Sci. Technol. 11 383 10.1088/0963-0252/11/4/304 2002PSST...11..383S
15. E.J.S. Raymond E. Stoffels R. Walraven J.A.T. Paul A.K. Ruben 2004 IEEE Trans. Plasma Sci. 32 187 10.1109/TPS.2004.828709
16. R. Foest E. Kindel A. Ohl M. Stieber K.-D. Weltmann 2005 Plasma Phys. Control. Fusion 47 B525 10.1088/0741-3335/47/12B/S38
17. V. Kapicka M. SIcha M. Klima Z. Hubicka J. Tous A. Brablec P. Slavicek J.F. Behnke M. Tichy R. VaculIk 1999 Plasma Source. Sci. Technol. 8 15 10.1088/0963-0252/8/1/002 1999PSST....8...15K
18. Z. Cao J.L. Walsh M.G. Kong 2009 Appl. Phys. Lett. 94 021501 10.1063/1.3069276 2009ApPhL..94b1501C
19. R.M. Sankaran K.P. Giapis 2002 J. Appl. Phys. 92 2406 10.1063/1.1497719 2002JAP....92.2406S
20. M. Laroussi X. Lu 2005 Appl. Phys. Lett. 87 113902 10.1063/1.2045549 2005ApPhL..87k3902L
21. C. Jiang M.T. Chen A. Gorur C. Schaudinn D.E. Jaramillo J.W. Costerton P.P. Sedghizadeh P.T. Vernier M.A. Gundersen 2009 Plasma Processes Polym. 6 479 10.1002/ppap.200800133
22. J.F. Kolb A.-A.H. Mohamed R.O. Price R.J. Swanson A. Bowman R.L. Chiavarini M. Stacey K.H. Schoenbach 2008 Appl. Phys. Lett. 92 241501 10.1063/1.2940325 2008ApPhL..92x1501K
23. K.H. Schoenbach A. El-Habachi W. Shi M. Ciocca 1997 Plasma Source. Sci. Technol. 6 468 10.1088/0963-0252/6/4/003 1997PSST....6..468S
24. K.H. Becker K.H. Schoenbach J.G. Eden 2007 J. Phys. D 39 55 10.1088/0022-3727/39/3/R01
25. A.-A.H. Mohamed R. Block K.H. Schoenbach 2002 IEEE Trans. Plasma Sci. 30 182 10.1109/TPS.2002.1003984 2002ITPS...30..182M
26. R.H. Stark K.H. Schoenbach 1999 Appl. Phys. Lett. 74 3770 10.1063/1.124174 1999ApPhL..74.3770S
27. H. Feng P. Sun Y. Chai G. Tong J. Zhang W. Zhu J. Fang 2009 IEEE Trans. Plasma Sci. 37 121 10.1109/TPS.2008.2008438 2009ITPS...37..121F
28. R. Block, O. Toedter, K.H. Schoenbach, Gas Temperature Measurements in High Pressure Glow Discharges in Air, Proc. of the 30th AIAA Plasma Dynamics and Lasers Conference, Norfolk, VA, June 28-July 1, 1999, paper AIAA-99-3434
29. S. Novopashin A. Muriel 2002 J. Exp. Theor. Phys. 95 262 10.1134/1.1506433 2002JETP...95..262N
30. D.D. Hsu D.B. Graves 2003 J. Phys. D 36 2898 10.1088/0022-3727/36/23/006 2003JPhD...36.2898H
31. T. Deconinck L.L. Raja 2009 Plasma Processes Polym. 6 335 10.1002/ppap.200800144
32. J.P. Boeuf L.C. Pitchford K.H. Schoenbach 2005 Appl. Phys. Lett. 86 071501 10.1063/1.1862781 2005ApPhL..86g1501B
33. F. Leipold, A.-A.H. Mohamed, K.H. Schoenbach, High electron density, atmospheric pressure air glow discharges, Conference Record of the 25th International Power Modulator Symposium, June 30-July 3, 2002, pp. 130-133
34. V. Leveille S. Clulombe 2005 Plasma Source. Sci. Technol. 14 467 10.1088/0963-0252/14/3/008 2005PSST...14..467L