Combustion chemical vapour deposition of Al2O3 films: Effect of temperature on structure, morphology and adhesion

Surface and Coatings Technology

Volumn 205, Issue 7, 2010, Pages 1838-1842

  Dhonge, Baban P ^a   Mathews, Tom ^a   Sundari, S Tirupura ^a   Kamruddin, M ^a   Dash, S ^a   Tyagi, A K ^a  

^a INDIRA GANDHI CENTRE FOR ATOMIC RESEARCH   (India)

Author keywords

alumina; Combustion CVD; Nanostructure; Scratch test; Thin film

Indexed keywords

ADHESION FAILURES; ALUMINA FILMS; CHEMICAL VAPOUR DEPOSITION; DEPOSITION TEMPERATURES; EFFECT OF TEMPERATURE; GRAIN SIZE; INTERFACIAL LAYER; INTERFACIAL OXIDE LAYERS; OPEN ATMOSPHERE; PREMIXED; SCRATCH TEST; SI (100) SUBSTRATE; SINGLE PHASE; TEMPERATURE RANGE;

ADHESION; ATMOSPHERIC TEMPERATURE; COMBUSTION; NANOSTRUCTURES; OXIDE FILMS; OXYGEN; SILICON COMPOUNDS; SUBSTRATES; THIN FILMS;

CHEMICAL VAPOR DEPOSITION;

EID: 78649733691     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.08.026     Document Type: Article

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