Advances in lithography on non-planar surfaces

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7716, Issue , 2010, Pages

  Radtke, Daniela ^a   Stumpf, Marko ^a   Zeitner, Uwe D ^a  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

Curved surfaces; Lithography; Microstructure fabrication

Indexed keywords

BACK REFLECTION; CONCENTRIC CIRCLES; CURVED STRUCTURE; CURVED SURFACES; EVEN LAYERS; FIELD OF VIEWS; GRAY SCALE; LASER LITHOGRAPHY; LAYER ALIGNMENT; LITHOGRAPHY SYSTEMS; MICROSTRUCTURE FABRICATION; MINIMUM FEATURE SIZES; NON-PLANAR SURFACES; OPERATION MODE; PLANAR LITHOGRAPHY; RADII OF CURVATURE; RADIUS OF CURVATURE; SPHERICAL SUBSTRATES;

MICROSTRUCTURE; SPHERES; SUBSTRATES;

LITHOGRAPHY;

EID: 78649696182     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.854272     Document Type: Conference Paper

References (10)

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10. Fimia, A., Carretero, L., and Beléndez, A., "Holographic optical elements recorded on spherical surfaces with photopolymers," Applied Optics 33, 3633-3634 (June 1994).