Strain effect of the dielectric constant in silicon dioxide

Journal of Microelectromechanical Systems

Volumn 19, Issue 6, 2010, Pages 1521-1523

  Huang, Jian Qiu ^a   Huang, Qing An ^a   Qin, Ming ^a   Dong, Weijie ^b   Chen, Xiaowei ^b  

^a Southeast University   (China)

^b DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Dielectric constant; mechanical stress; micromachining; silicon dioxide; test structure

Indexed keywords

BENDING METHODS; DIELECTRIC CONSTANTS; MECHANICAL STRESS; SILICON DIOXIDE; STRAIN EFFECT; TEST STRUCTURE;

COMPOSITE MICROMECHANICS; MICROMACHINING; PERMITTIVITY; SILICA; SILICON OXIDES;

STRESSES;

EID: 78649658576     PISSN: 10577157     EISSN: None     Source Type: Journal    
DOI: 10.1109/JMEMS.2010.2082500     Document Type: Article

References (14)

1. S. E. Thompson, M. Armstrong, C. Auth, S. Cea, R. Chau, G. Glass, T. Hoffman, J. Klaus, Z. Ma, B. Mcintyre, A. Murthy, B. Obradovic, L. Shifren, S. Sivakumar, S. Tyagi, T. Ghani, K. Mistry, M. Bohr, and Y. El-Mansy, "A logic nanotechnology featuring strained-silicon," IEEE Electron Device Lett., vol. 25, no. 4, pp. 191-193, Apr. 2004.
2. J. L. Hoyt, H. M. Nayfeh, S. Eguchi, I. Aberg, G. Xia, T. Drake, E. A. Fitzgerald, and D. A. Antoniadis, "Strained silicon MOSFET technology," in IEDM Tech. Dig., Washington, DC, 2002, pp. 23-26.
3. M.-X. Zhou, Q.-A. Huang, M. Qin, and W. Zhou, "A novel capacitive pressure sensor based on sandwich structures," J. Microelectromech. Syst., vol. 14, no. 6, pp. 1272-1282, Dec. 2005.
4. H.-Y. Ma, Q.-A. Huang, M. Qin, and T.-T. Lu, "A micromachined silicon capacitive temperature sensor for radiosonde applications," in Proc. IEEE SENSORS Conf., Christchurch, New Zealand, Oct. 2009, pp. 1693-1696.
5. 2 in the sandwich structure," in Proc. 21st IEEE Int. Conf. MEMS, 2008, pp. 455-458.
6. R. G. Budynas, Advanced Strength and Applied Stress Analysis. New York: McGraw-Hill, 1977.
7. K. E. Bisshopp and D. C. Drucker, "Large deflection of cantilever beams," Quart. Appl. Math, vol. 3, no. 3, pp. 272-275, 1945.
8. T. Belendez, C. Neipp, and A. Belendez, "Large and small defections of a cantilever beam," Eur. J. Phys., vol. 23, no. 3, pp. 371-379, May 2002.
9. C. Liu, Foundations of MEMS. Englewood Cliffs, NJ: Prentice-Hall, 2006.
10. G. G. Stoney, "The tension of metallic films deposited by electrolysis," Proc. R. Soc. Lond. A, Math. Phys. Sci., vol. 82, no. 553, pp. 172-175, May 1909.
11. J. A. Stratton, Electromagnetic Theory. New York: McGraw-Hill, 1977.
12. L. D. Landau and E. M. Lifshitz, Electrodynamics of Continuous Media. New York: Pergamon, 1984.
13. Y. M. Shkel and D. J. Klingenberg, "Electrostriction of polarizable materials: Comparison of models with experimental data," J. Appl. Phys., vol. 83, no. 1, pp. 415-424, Jan. 1998.
14. Y. Peng, Y. M. Shkel, and G. H. Kim, "Stress dielectric response in liquid polymers," J. Rheol., vol. 49, no. 1, pp. 297-311, Feb. 2005.