Localized surface plasmon polariton enhanced radiative recombination in ion-implanted silicon emitters

Applied Physics Express

Volumn 3, Issue 10, 2010, Pages

  Singh, Akhilesh K ^a   Gryczynski, Karol G ^a   McDaniel, Floyd D ^a   Park, Seong Y ^b   Kim, Moon ^b   Neogi, Arup ^a  

^a UNIVERSITY OF NORTH TEXAS   (United States)

^b UNIVERSITY OF TEXAS AT DALLAS   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BOUND EXCITON; CRYSTALLINE SI; ION-IMPLANTED SILICON; LOCAL-FIELD EFFECTS; LOCALIZED SURFACE PLASMON; LOW ENERGIES; METAL NANOPARTICLES; NANO SCALE; PHOTOLUMINESCENCE ENHANCEMENT; RADIATIVE RECOMBINATION; RADIATIVE RECOMBINATION RATE; RESONANT COUPLINGS; SILICON NANOPARTICLES; SILVER IONS;

ION BEAMS; ION IMPLANTATION; METAL IONS; NANOPARTICLES; PHONONS; PHOTONS; PLASMONS; QUANTUM THEORY; SILVER;

SURFACE PLASMON RESONANCE;

EID: 78549257077     PISSN: 18820778     EISSN: 18820786     Source Type: Journal    
DOI: 10.1143/APEX.3.102201     Document Type: Article

References (20)

1. X. L. Wu and F. S. Xue: Appl. Phys. Lett. 84 (2004) 2808.
2. T. Kim et al.: Appl. Phys. Lett. 85 (2004) 5355.
3. I. Sychugov et al.: Phys. Rev. Lett. 94 (2005) 087405.
4. N. M. Park et al.: Phys. Rev. Lett. 86 (2001) 1355.
5. D. J. Lockwood et al.: Phys. Rev. Lett. 76 (1996) 539.
6. K. Tomioka and S. Adachi: Appl. Phys. Lett. 87 (2005) 251920.
7. A. Arbouet et al.: J. Lumin. 121 (2006) 340.
8. L. J. Mitchell et al.: J. Non-Cryst. Solids 352 (2006) 2408.
9. W. Gerlach et al.: Phys. Status Solidi A 13 (1972) 277.
10. K. Okamoto et al.: Phys. Status Solidi C 5 (2008) 2822.
11. A. Neogi et al.: Phys. Rev. B 66 (2002) 153305.
12. A. Hryciw et al.: Opt. Express 17 (2009) 185.
13. A. Singh et al.: Tech. Proc. 2009 NSTI Nanotechnology, 2009, Vol. 1, p. 570.
14. I. Sychugov: Doctoral Thesis, Royal Institute of Technology, Stockholm, Sweden (2006).
15. A. Hryciw et al.: Nucl. Instrum Method Phys. Res., Sect. B 222 (2004) 469.
16. G. A. Shah: Kodaikanal Obs. Bull. Ser. A 2 (1977) 42.
17. X. Yang et al.: Appl. Phys. Lett. 86 (2005) 201906.
18. F. Huisken et al.: Silicon Chemistry: From the Atom to Extended System, ed. P. Jutzi and U. Schubert (Wiley-VCH, Weinheim, 2003) p. 293.
19. A. A. Bagabas et al.: Nanotechnology 20 (2009) 355703.
20. L. Tsybeskov et al.: Phys. Rev. B 49 (1994) 7821