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Volumn 97, Issue 17, 2010, Pages

Effect of electron-beam irradiation on graphene field effect devices

Author keywords

[No Author keywords available]

Indexed keywords

COMMONLY USED; ELECTRON-BEAM EXPOSURE; ELECTRON-BEAM IRRADIATIONS; ELECTRONIC TRANSPORT PROPERTIES; ENERGETIC ELECTRON; FIELD-EFFECT DEVICES; GRAPHENE DEVICES; N-DOPING; NEGATIVE SHIFT; NEUTRAL POINTS; RADIATION-HARD;

EID: 78149441176     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3502610     Document Type: Article
Times cited : (170)

References (21)
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    • Lopez, J.J.1    Greer, F.2    Greer, J.R.3
  • 13
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    • JAPIAU 0021-8979,. 10.1063/1.3318261
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    • NNOTER 0957-4484,. 10.1088/0957-4484/21/26/265705
    • M. Xu, D. Fujita, and N. Hanagata, Nanotechnology NNOTER 0957-4484 21, 265705 (2010). 10.1088/0957-4484/21/26/265705
    • (2010) Nanotechnology , vol.21 , pp. 265705
    • Xu, M.1    Fujita, D.2    Hanagata, N.3
  • 21
    • 78149454306 scopus 로고    scopus 로고
    • To suspend the graphene devices, we dithe device in a buffered oxide etchant for 1 min, rinse the etchant with acetone and isopropyl alcohol (IPA), then dry the IPA with a critical-point dryer to reduce surface tensions
    • To suspend the graphene devices, we dip the device in a buffered oxide etchant for 1 min, rinse the etchant with acetone and isopropyl alcohol (IPA), then dry the IPA with a critical-point dryer to reduce surface tensions.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.