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Journal of Applied Physics

Volumn 107, Issue 10, 2010, Pages

Enhanced resistance of single-layer graphene to ion bombardment

(3) Lopez, J J a Greer, F b Greer, J R c

a East Los Angeles College (United States)

b CALIFORNIA INSTITUTE OF TECHNOLOGY (United States)

c California Institute of Technology (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATING VOLTAGES; DUAL BEAM; HYDROGENATED AMORPHOUS CARBON FILMS; ION BEAM SYSTEM; ION FLUXES; SI SUBSTRATES; SINGLE LAYER;

AMORPHOUS CARBON; AMORPHOUS FILMS; CARBON FILMS; GALLIUM ALLOYS; GRAPHENE; GRAPHITE; ION BEAMS; IONS; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SILICON COMPOUNDS;

ION BOMBARDMENT;

EID: 77952974430 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3428466 Document Type: Article

Times cited : (28)

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