Inverse opal photonic crystal of chalcogenide glass by solution processing

Journal of Colloid and Interface Science

Volumn 353, Issue 2, 2011, Pages 454-458

  Kohoutek, Tomas ^a,c   Orava, Jiri ^b,c   Sawada, Tsutomu ^d   Fudouzi, Hiroshi ^d  

^a TOYOTA TECHNOLOGICAL INSTITUTE   (Japan)

^b UNIVERSITY OF CAMBRIDGE   (United Kingdom)

^c UNIVERSITY OF PARDUBICE   (Czech Republic)

^d NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

Author keywords

Chalcogenide glasses; Colloidal crystals; Colloidal templates; Self assembly; Spin coating

Indexed keywords

CHALCOGENIDE GLASS; COLLOIDAL CRYSTAL FILMS; COLLOIDAL CRYSTALS; COLLOIDAL SOLUTIONS; COLLOIDAL TEMPLATES; HF ACID; HIGH REFRACTIVE INDEX; INVERSE OPAL; INVERSE-OPAL STRUCTURE; LOW TEMPERATURES; OPAL FILMS; PHOTONIC PROPERTIES; PHOTONIC STRUCTURE; PHOTONIC WAVEGUIDES; REFLECTIVITY VALUES; SILICA OPAL FILMS; SILICA OPALS; SOLUTION-PROCESSING; SPIN-COATING METHOD;

FABRICATION; FILM PREPARATION; GLASS; INORGANIC POLYMERS; NANOSENSORS; ORGANIC POLYMERS; PHOTONIC CRYSTALS; PHOTONIC DEVICES; PLASTIC COATINGS; PLASTIC FILMS; POLYMER FILMS; REFRACTIVE INDEX; SELF ASSEMBLY; SILICA; SPIN GLASS;

OPTICAL FILMS;

ARTICLE; CHALCOGENIDE GLASS; COLLOID; CRYSTALLIZATION; NANOFABRICATION; PRIORITY JOURNAL; SPIN COATING; TECHNIQUE;

EID: 78149406780     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2010.10.011     Document Type: Article

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