Dry etching of colloidal crystal films

Journal of Colloid and Interface Science

Volumn 341, Issue 2, 2010, Pages 209-214

  Cho, Young Sang ^a   Yi, Gi Ra ^b   Moon, Jun Hyuk ^c   Kim, Dae Chul ^d   Lee, Bong Ju ^d   Yang, Seung Man ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

^b Chungbuk National University   (South Korea)

^c Sogang University   (South Korea)

^d Korea Basic Science Institute (KBSI)   (South Korea)

Author keywords

Colloidal crystal; Hyperthermal neutral beam; Photonic bandgap; Reactive ion etching

Indexed keywords

CLOSE PACKED STRUCTURES; COLLOIDAL CRYSTAL FILMS; COLLOIDAL CRYSTALS; COLLOIDAL PHOTONIC CRYSTALS; CONNECTING NETWORKS; DRY ETCHING PROCESS; ETCHING PROCESS; GLASS TRANSITION TEMPERATURE; INVERSE OPAL; LATTICE PLANE; NEUTRAL BEAMS; OPEN STRUCTURE; OXYGEN GAS; PACKED COLLOIDAL CRYSTALS; POLYMER PARTICLES; STOP-BANDS; TOP SURFACE;

CRYSTAL STRUCTURE; DRY ETCHING; ENERGY GAP; GLASS TRANSITION; IONS; NANOSPHERES; OXYGEN; PARTICLE BEAMS; PHOTONIC CRYSTALS; PLASMA ETCHING; PLASTIC FILMS; POLYSTYRENES; SILICA; SINTERING; SPONTANEOUS EMISSION; TOKAMAK DEVICES;

REACTIVE ION ETCHING;

NANOSPHERE; OXYGEN; POLYMER; POLYSTYRENE; SILICON DIOXIDE;

ARTICLE; CHEMICAL PROCEDURES; CHEMICAL STRUCTURE; COLLOID; CRYSTAL; DRY ETCHING; FILM; GAS; MORPHOLOGY; PRIORITY JOURNAL; TEMPERATURE; VAPOR;

EID: 70449670308     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2009.09.060     Document Type: Article

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