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Volumn 95, Issue 1, 2011, Pages 190-194
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Structural and optical properties of textured ZnO:Al films on glass substrates prepared by in-line rf magnetron sputtering
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Author keywords
Solar cell; Surface morphology; ZnO:Al film
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Indexed keywords
AS-DEPOSITED FILMS;
BOTTOM CELLS;
DEPOSITION PARAMETERS;
ETCHING CONDITION;
EXPERIMENTAL CONDITIONS;
GLASS SUBSTRATES;
HAZE FACTORS;
IN-LINE;
INITIAL FILM;
LONG WAVELENGTH;
LOW RESISTIVITY;
OPTICAL TRANSMITTANCE;
PREFERRED ORIENTATIONS;
RF-MAGNETRON SPUTTERING;
SCATTERING PROPERTY;
SILICON THIN FILM;
STRUCTURAL AND OPTICAL PROPERTIES;
SUBSTRATE TEMPERATURE;
SURFACE FEATURE;
TANDEM STRUCTURE;
VISIBLE RANGE;
WET-ETCHING PROCESS;
WORKING PRESSURES;
ZNO;
ZNO:AL FILMS;
ALUMINUM;
ANGULAR DISTRIBUTION;
GLASS;
LIGHT SCATTERING;
MAGNETRON SPUTTERING;
METALLIC FILMS;
MICROSTRUCTURE;
MORPHOLOGY;
OPTICAL PROPERTIES;
PRESSURE EFFECTS;
REFRACTION;
SEMICONDUCTING SILICON COMPOUNDS;
SILICON;
SOLAR CELLS;
STRUCTURE (COMPOSITION);
SUBSTRATES;
SURFACE MORPHOLOGY;
SWITCHING CIRCUITS;
THIN FILMS;
WET ETCHING;
ZINC OXIDE;
FILM PREPARATION;
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EID: 78149359639
PISSN: 09270248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.solmat.2010.03.032 Document Type: Conference Paper |
Times cited : (30)
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References (10)
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