Oxidation and etching of CVD diamond by thermal and hyperthermal atomic oxygen

Journal of Physical Chemistry C

Volumn 114, Issue 44, 2010, Pages 18996-19003

  Shpilman, Zeev ^a   Gouzman, Irina ^a   Grossman, Eitan ^a   Shen, Linhan ^b   Minton, Timothy K ^b   Paci, Jeffrey T ^c   Schatz, George C ^d   Akhvlediani, Rozalia ^e   Hoffman, Alon ^e  

^a Soreq NRC ^*  (Israel)

^b MONTANA STATE UNIVERSITY   (United States)

^c UNIVERSITY OF VICTORIA   (Canada)

^d NORTHWESTERN UNIVERSITY   (United States)

^e TECHNION ISRAEL INSTITUTE OF TECHNOLOGY   (Israel)

Author keywords

[No Author keywords available]

Indexed keywords

AMBIENT CONDITIONS; ATOMIC OXYGEN; CARBON REMOVAL; CHEMICAL BONDINGS; CHEMICAL VAPOR DEPOSITED DIAMOND; CVD DIAMOND; DENSITY FUNCTIONALS; DIAMOND SURFACES; DIRECT DYNAMICS; GRAPHITIC LAYERS; HIGH-RESOLUTION ELECTRON ENERGY LOSS SPECTROSCOPY; HYPERTHERMAL; HYPERTHERMAL ATOMIC OXYGEN; ISOTOPIC LABELING; OXYGEN ATOM; RELEVANT REACTIONS; SELECTIVE ETCHING; THEORETICAL SIMULATION; TIGHT BINDING METHODS;

ADSORPTION; ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; ATOMS; CHEMICAL BONDS; CHEMICAL VAPOR DEPOSITION; DESORPTION; DIAMOND FILMS; DIAMONDS; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; ETCHING; HIGH RESOLUTION ELECTRON MICROSCOPY; HYDROCARBONS; KETONES; MORPHOLOGY; OXYGEN; SURFACE REACTIONS;

SURFACE MORPHOLOGY;

EID: 78149253239     PISSN: 19327447     EISSN: 19327455     Source Type: Journal    
DOI: 10.1021/jp1073208     Document Type: Article

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