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Volumn 205, Issue 9, 2008, Pages 2130-2135
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Chemical and morphological aspects of diamond film oxidation and regeneration
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Author keywords
[No Author keywords available]
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Indexed keywords
ATOMIC FORCES;
ATOMIC OXYGENS;
CHEMICAL COMPOSITIONS;
CVD DIAMOND FILMS;
DIAMOND SURFACES;
EROSION YIELDS;
EX-SITU;
FILM OXIDATIONS;
GRAIN SIZES;
GRANULAR;
HIGH RESOLUTION ELECTRON ENERGY LOSSES;
HIGH VACUUMS;
HOT FILAMENTS;
HYDROGEN PLASMAS;
HYDROGEN TREATMENTS;
IN-SITU;
MORPHOLOGICAL ASPECTS;
MORPHOLOGICAL EFFECTS;
OPTICAL PHONONS;
OXYGEN PLASMA EXPOSURES;
OXYGEN PLASMAS;
PLASMA TREATMENTS;
PREFERENTIAL ETCHINGS;
REGENERATION MECHANISMS;
SELECTIVE ETCHINGS;
SURFACE BONDINGS;
TAPPING MODES;
UNSATURATED HYDROCARBONS;
UPPER SURFACES;
ANNEALING;
ARCTIC ENGINEERING;
ATOMIC PHYSICS;
ATOMIC SPECTROSCOPY;
ATOMS;
CHEMICAL OXYGEN DEMAND;
CHEMICAL VAPOR DEPOSITION;
DIAMOND CUTTING TOOLS;
DIAMOND FILMS;
DIAMONDS;
ELECTRON ENERGY LOSS SPECTROSCOPY;
ENERGY DISSIPATION;
ETCHING;
HIGH RESOLUTION ELECTRON MICROSCOPY;
HYDROCARBONS;
HYDROGEN;
NONMETALS;
ORGANIC COMPOUNDS;
OXIDATION;
OXYGEN;
PLASMA APPLICATIONS;
PLASMAS;
SURFACE TREATMENT;
SURFACE MORPHOLOGY;
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EID: 54249125029
PISSN: 18626300
EISSN: 18626319
Source Type: Journal
DOI: 10.1002/pssa.200879708 Document Type: Conference Paper |
Times cited : (8)
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References (29)
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