Study on Raman line at 1080.2 cm-1 in ZnO thin films prepared under high RF power

Vacuum

Volumn 84, Issue 11, 2010, Pages 1315-1318

  Xu, Qiong ^a   Zhu, Xingwen ^a   Zhang, Fang ^a   Yang, Longxing ^a   Jiang, Wenzhong ^a   Zhou, Xiao ^a  

^a SHANGHAI UNIVERSITY   (China)

Author keywords

Photoluminescence; Raman scattering; RF magnetron sputtering; Zinc thin film

Indexed keywords

RAMAN CHARACTERISTICS; RAMAN LINES; RAMAN MODES; RAMAN SPECTRA; RF MAGNETRON SPUTTERING; RF MAGNETRON SPUTTERING METHOD; RF-POWER; ZNO; ZNO FILMS; ZNO THIN FILM;

MAGNETRON SPUTTERING; METALLIC FILMS; OPTICAL FILMS; PHOTOLUMINESCENCE; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SCATTERING; THIN FILMS; VAPOR DEPOSITION; X RAY DIFFRACTION; ZINC; ZINC OXIDE;

FILM PREPARATION;

EID: 78049418139     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.02.010     Document Type: Article

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