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Volumn 49, Issue 9 PART 2, 2010, Pages

Annealing effects on sensitivity of atomic-layer-deposited SrTiO 3-based oxygen sensors

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING EFFECTS; ANNEALING TEMPERATURES; ATOMIC LAYER DEPOSITED; HIGH SENSITIVITY; IN-SITU MONITORING; KEY PARAMETERS; MANUFACTURING PROCESS; ROOM TEMPERATURE; SEMICONDUCTIVE; SRTIO; TRACE LEVEL;

EID: 78049326599     PISSN: 00214922     EISSN: 13474065     Source Type: Journal    
DOI: 10.1143/JJAP.49.09MA15     Document Type: Conference Paper
Times cited : (10)

References (24)
  • 17
    • 78049345195 scopus 로고    scopus 로고
    • Dr. Thesis, Faculty of Chemistry, University of Stuttgart, Stuttgard 2004
    • B. R. Kalkhoran: Dr. Thesis, Faculty of Chemistry, University of Stuttgart, Stuttgard (2004).
    • Kalkhoran, B.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.