Biaxially textured Al film growth on CaF2 nanostructures toward a method of preparing single-crystalline Si film on glass substrates

ACS Nano

Volumn 4, Issue 10, 2010, Pages 5627-5632

  Li, Huafang ^a   Snow, Patrick ^a   He, Ming ^a   Wang, Pei I ^a   Wang, Gwo Ching ^a   Lu, Toh Ming ^a  

^a Rensselaer Polytechnic Institute   (United States)

Author keywords

nanoepitaxy; oblique angle deposition; physical vapor deposition; silicon technology; solid phase transformation; transmission electron microscopy

Indexed keywords

NANOEPITAXY; OBLIQUE ANGLE DEPOSITION; SILICON TECHNOLOGY; SOLID PHASE TRANSFORMATION; TRANSMISSION ELECTRON;

ALUMINUM; AMORPHOUS FILMS; AMORPHOUS SILICON; CRYSTALLINE MATERIALS; GLASS; METALLIC FILMS; NANORODS; PHYSICAL VAPOR DEPOSITION; SUBSTRATES; TRANSMISSION ELECTRON MICROSCOPY;

FILM GROWTH;

EID: 78049325576     PISSN: 19360851     EISSN: 1936086X     Source Type: Journal    
DOI: 10.1021/nn1011978     Document Type: Article

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