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Applied Surface Science

Volumn 257, Issue 5, 2010, Pages 1779-1785

Deposition and wettability of silver nanostructures on Si(1 0 0) substrate based on galvanic displacement reactions

(3) Gu, C D a Tu, J P a Zhang, T Y b

a ZHEJIANG UNIVERSITY (China)

b HONG KONG UNIVERSITY OF SCIENCE AND TECHNOLOGY (Hong Kong)

Author keywords

Electroless silver deposition; Hydrophobic; Silicon; Silver nanowires; Unidirectional wetting

Indexed keywords

DEPOSITION; ELECTRIC RESISTANCE MEASUREMENT; ELECTROLYTES; HYDROPHOBICITY; METALLIC FILMS; NANOWIRES; NITROGEN COMPOUNDS; SILICON; SILVER COMPOUNDS; SILVER NANOPARTICLES; SODIUM COMPOUNDS; SUBSTITUTION REACTIONS; SUBSTRATES; WETTING;

ELECTROLESS SILVER DEPOSITIONS; ELECTROLYTE COMPOSITIONS; GALVANIC DISPLACEMENT REACTIONS; HYDROPHOBIC; HYDROPHOBIC PROPERTIES; POLY VINYL PYRROLIDONE; SILVER NANOWIRES; WETTING AND SPREADING;

FLUORINE COMPOUNDS;

EID: 78049269455 PISSN: 01694332 EISSN: None Source Type: Journal
DOI: 10.1016/j.apsusc.2010.09.015 Document Type: Article

Times cited : (14)

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