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Volumn 624, Issue 1, 2010, Pages 114-117

Influence of multi-depositions on the final properties of thermally evaporated TlBr films

Author keywords

Semiconductor films; Thallium bromide; Thermal evaporation; X ray detector

Indexed keywords

APPLIED VOLTAGES; CANDIDATE MATERIALS; DEPOSITED FILMS; ELECTRICAL RESISTIVITY; FABRICATION PARAMETERS; LINEAR REGION; MEDICAL X-RAYS; MORPHOLOGICAL CHANGES; OPTICAL AND ELECTRICAL PROPERTIES; OPTICAL GAP; SEMICONDUCTOR FILMS; TECHNOLOGICAL APPLICATIONS; THALLIUM BROMIDE; THICKNESS OF THE FILM; X-RAY DETECTOR;

EID: 78049260052     PISSN: 01689002     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.nima.2010.09.006     Document Type: Article
Times cited : (16)

References (19)
  • 4
    • 0003998388 scopus 로고    scopus 로고
    • CRC, Internet Version 2010, Section 4: Properties of the Elements and Inorganic Compounds.
    • CRC, Handbook of Chemistry and Physics, 90th ed., Internet Version 2010, Section 4: Properties of the Elements and Inorganic Compounds.
    • Handbook of Chemistry and Physics, 90th ed.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.