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Volumn 624, Issue 1, 2010, Pages 114-117
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Influence of multi-depositions on the final properties of thermally evaporated TlBr films
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Author keywords
Semiconductor films; Thallium bromide; Thermal evaporation; X ray detector
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Indexed keywords
APPLIED VOLTAGES;
CANDIDATE MATERIALS;
DEPOSITED FILMS;
ELECTRICAL RESISTIVITY;
FABRICATION PARAMETERS;
LINEAR REGION;
MEDICAL X-RAYS;
MORPHOLOGICAL CHANGES;
OPTICAL AND ELECTRICAL PROPERTIES;
OPTICAL GAP;
SEMICONDUCTOR FILMS;
TECHNOLOGICAL APPLICATIONS;
THALLIUM BROMIDE;
THICKNESS OF THE FILM;
X-RAY DETECTOR;
BROMINE COMPOUNDS;
ELECTRIC CONDUCTIVITY;
MEDICAL IMAGING;
OPTOELECTRONIC DEVICES;
THALLIUM;
X RAY APPARATUS;
X RAYS;
THERMAL EVAPORATION;
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EID: 78049260052
PISSN: 01689002
EISSN: None
Source Type: Journal
DOI: 10.1016/j.nima.2010.09.006 Document Type: Article |
Times cited : (16)
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References (19)
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