An efficient and reliable two-dimensional patterning of porous silicon

Journal of Porous Media

Volumn 13, Issue 6, 2010, Pages 557-563

  Hajghassem, H ^a   Erfanian, A ^b   Mohtashamifar, M ^c   Aliahmadi, M ^c   Alehashemi, S Morteza ^c   Banihashemian, S Maryam ^d  

^a SHAHID BEHESHTI UNIVERSITY   (Iran)

^b K N TOOSI UNIVERSITY OF TECHNOLOGY   (Iran)

^c Electronic Research Center   (Iran)

^d ISLAMIC AZAD UNIVERSITY   (Iran)

Author keywords

Cr au patterning mask; Si; Two dimensional ps arrays

Indexed keywords

ATOMIC FORCE MICROSCOPES; CORRELATION COEFFICIENT; CR/AU PATTERNING MASK; HIGHER RESOLUTION; NANO-POROUS; OPTICAL MICROSCOPES; PHOTORESIST MASK; PHOTORESIST PATTERNING; POROUS SI; SCANNING ELECTRON MICROSCOPE; SI; STATISTICAL IMAGES; SU-8 PHOTORESIST; SURFACE REGION; TWO-DIMENSIONAL PATTERNING; TWO-DIMENSIONAL PATTERNS;

IMAGE ANALYSIS; MICROSCOPES; OPTICAL DATA PROCESSING; PHOTORESISTS; SCANNING ELECTRON MICROSCOPY; SURFACE TREATMENT; TWO DIMENSIONAL;

POROUS SILICON;

EID: 77958550631     PISSN: 1091028X     EISSN: None     Source Type: Journal    
DOI: 10.1615/JPorMedia.v13.i6.50     Document Type: Article

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