Shadow overlap ion-beam lithography for nanoarchitectures

Nano Letters

Volumn 9, Issue 11, 2009, Pages 3726-3731

  Choi, Yeonho ^a   Hong, Soongweon ^a   Lee, Luke P ^a  

^a University of California at Berkeley   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BATCH FABRICATION; BIOLOGICAL SENSORS; COST-EFFECTIVE METHODS; DIFFRACTION EFFECTS; HIGH DENSITY MEMORY; HIGH SPATIAL RESOLUTION; HIGH-SPEED ELECTRONICS; METAL DEPOSITION; MICRO AND MACRO; NANOARCHITECTURES; NANOFABRICATION TECHNIQUES; NANOSCALE DEVICE; OPTICAL ANTENNAS; OPTICAL LITHOGRAPHY; PARALLEL PROCESSING; PLASMONICS; SHADOW IMAGES; SIGNIFICANT IMPACTS;

IMAGE RESOLUTION; ION BEAM LITHOGRAPHY; ION BEAMS; IONS; LIGHT; NANOSTRUCTURED MATERIALS; OPTICAL INSTRUMENTS; PHOTOLITHOGRAPHY; SENSORS; SOILS; THREE DIMENSIONAL;

ANTENNAS;

EID: 72849122337     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl901911p     Document Type: Article

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