The structure and growth mechanism of Si nanoneedles prepared by plasma-enhanced chemical vapor deposition

Nanotechnology

Volumn 21, Issue 41, 2010, Pages

  Cervenka J ^a   Ledinsky M ^a   Stuchlik J ^a   Stuchlikova H ^a   Bakardjieva, S ^b   Hruska K ^a   Fejfar, A ^a   Kocka J ^a  

^a INSTITUTE OF PHYSICS   (Czech Republic)

^b INSTITUTE OF INORGANIC CHEMISTRY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CATALYTIC PARTICLES; DEVICE APPLICATION; GROWTH MECHANISMS; LOW TEMPERATURES; MICRO RAMAN SPECTROSCOPY; SILICON NANOWIRES; WORKING GAS;

CRYSTAL STRUCTURE; NANONEEDLES; NANOPHOTONICS; NANOWIRES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SILICON;

HIGH RESOLUTION ELECTRON MICROSCOPY;

EID: 77958522814     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/41/415604     Document Type: Article

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