Characterization of nano-crystalline diamond films grown by continuous DC bias during plasma enhanced chemical vapor deposition

Materials Research Society Symposium Proceedings

Volumn 1203, Issue , 2010, Pages 41-46

  Mortet, V ^a   Zhang, L ^b   Eckert, M ^b   Soltani, A ^c   D'Haen, J ^a   Douheret O ^d   Moreau, M ^e   Osswald, S ^f   Neyts, E ^b   Troadec, D ^c   Wagner, P ^a   Bogaerts, A ^b   Van Tendeloo, G ^b   Haenen, K ^a  

^a HASSELT UNIVERSITY   (Belgium)

^b UNIVERSITY OF ANTWERP   (Belgium)

^c INSTITUT D ELECTRONIQUE   (France)

^d MATERIA NOVA RESEARCH CENTER   (Belgium)

^e UNIVERSITÉ DES SCIENCES ET TECHNOLOGIES DE LILLE   (France)

^f Drexel University   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AFM; BULK STRUCTURE; CRYSTALLINITIES; DC BIAS; DC BIAS VOLTAGE; DIAMOND-LIKE; FTIR SPECTROSCOPY; GRAIN SIZE; HIGH CONCENTRATION; HYDROGEN CONTENTS; METHANE CONCENTRATIONS; MULTI-WAVELENGTHS; NANO GRAINS; NANOCRYSTALLINE DIAMOND FILMS; NANODIAMOND FILMS; NUCLEATION RATE; OPTICAL TECHNIQUE; SEM; SILICON SUBSTRATES; TEM; UV-RAMAN SPECTROSCOPY; XRD;

AMORPHOUS FILMS; DIAMONDS; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDROGEN; METHANATION; METHANE; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SCATTERING; RAMAN SPECTROSCOPY; SURFACE ROUGHNESS; SURFACE STRUCTURE;

DIAMOND FILMS;

EID: 77958486605     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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