Influence of the nitrogen content on the electrochemical capacitor characteristics of vertically aligned carbon nanotubes

Physica E: Low-Dimensional Systems and Nanostructures

Volumn 42, Issue 10, 2010, Pages 2799-2803

  Lee, Kuei Yi ^a   Lin, Yu Sheng ^a   Chen, Yi Min ^a   Huang, Ying Sheng ^a  

^a NATIONAL TAIWAN UNIVERSITY OF SCIENCE AND TECHNOLOGY   (Taiwan)

Author keywords

Capacitance; Carbon nanotube; Chemical vapor deposition; Electrochemical capacitor; Nitrogen doping

Indexed keywords

CAPACITANCE CHARACTERISTICS; CHEMICAL VAPOR; DEVICE MATERIALS; ELECTROCHEMICAL CAPACITOR; NITROGEN CONTENT; NITROGEN DOPING; NITROGEN-DOPED; SUPER CAPACITOR; THERMAL CHEMICAL VAPOR DEPOSITION; VERTICALLY ALIGNED CARBON NANOTUBE;

CAPACITANCE; CAPACITORS; CARBON NANOTUBES; DOPING (ADDITIVES); NITROGEN;

CHEMICAL VAPOR DEPOSITION;

EID: 77957979187     PISSN: 13869477     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.physe.2010.01.011     Document Type: Conference Paper

References (30)

1. Y. Show, and K. Imaizumi Diamond Relat. Mater 15 2006 2086
2. H.-B. Gu, J.-U. Kim, H.-W. Song, G.-C. Park, and B.-K. Park Electrochim. Acta 45 2000 1533
3. Y. Nagao, Y. Nakayama, H. Oda, and M. Ishikawa J. Power Sources 166 2007 595
4. C. Niu, E.K. Sichel, R. Hoch, D. Moy, and H. Tennent Appl. Phys. Lett. 70 1997 1480
5. G. Arabale, D. Wagh, M. Kulkarni, I.S. Mulla, S.P. Vernekar, K. Vijayamohanan, and A.M. Rao Chem. Phys. Lett. 376 2003 207
6. C.-C. Hu, J.-H. Su, and T.-C. Wen J. Phys. Chem. Solids 68 2007 2353
7. C.-T. Hsieh, W.-Y. Chen, and J.-H. Lin Microporous Mesoporous Mater. 122 2009 155
8. W.-C. Fang Nanotechnology 19 2008 165705
9. S. Iijima Nature 354 1991 56
10. S. Fan, M.G. Chapline, N.R. Franklin, T.W. Tombler, A.M. Cassell, and H. Dai Science 283 1999 512
11. A. Modi, N. Koratkar, E. Lass, B. Wei, and P.M. Ajayan Nature 424 2003 171
12. M.S. Dresselhaus, G. Dresselhaus, P. Avouris, Carbon nanotubes: Synthesis, Structure, Properties, and Applications 2001 Springer Berlin
13. G. Liu, S.L. Riechers, M.C. Mellen, and Y. Lin Electrochem. Commun. 7 2005 1163
14. N.S. Lawrence, and J. Wang Electrochem. Commun. 8 2006 71
15. J. Okuno, K. Maehashi, K. Matsumoto, K. Kerman, Y. Takamura, and E. Tamiya Electrochem. Commun. 9 2007 13
16. Y.G. Lin, Y.K. Hsu, C.T. Wu, S.Y. Chen, K.H. Chen, and L.C. Chen Diamond Relat. Mater. 18 2009 433
17. K. Jurewicz, K. Babe, A. Źikowski, and H. Wachowska Electrochim. Acta 48 2003 1491
18. C.P. Ewels, and M. Glerup J. Nanosci. Nanotechnol. 5 2005 1345
19. P. Ayala, R. Arenal, M. Rmmeli, A. Rubio, and T. Pichler Carbon 48 2010 575
20. C.-L. Sun, L.-C. Chen, M.-C. Su, L.-S. Hong, O. Chyan, C.-Y. Hsu, K.-H. Chen, T.-F. Chang, and L. Chang Chem. Mater. 17 2005 3749
21. A. Gohel, K.C. Chin, Y.W. Zhu, C.H. Sow, and A.T.S. Wee Carbon 43 2005 2530
22. P. Ghosh, M. Tanemura, T. Soga, M. Zamri, and T. Jimbo Solid State Commun. 147 2008 15
23. R.Y. Zhang, I. Amlani, J. Baker, J. Tresek, R.K. Tsui, and P. Fejes Nano Lett. 3 2003 731
24. W.G. Xie, J. Chen, J. Chen, W.W. Ming, S.Z. Deng, and N.S. Xu Ultramicroscopy 109 2009 451
25. J.-M. Ting, and S.-H. Lin Carbon 45 2007 1934
26. A. Felten, C. Bittencourt, J.J. Pireaux, G. Van Lier, and J.C. Charlier J. Appl. Phys. 98 2005 074308
27. J.M. Walls, Methods of Surface Analysis 1989 Cambridge University Press Cambridge
28. H. Nii, Y. Sumiyama, H. Nakagawa, and A. Kunishige Appl. Phys. Express 1 2008 064005
29. J.H. Yang, B.J. Kim, Y.H. Kim, Y.J. Lee, B.H. Ha, Y.S. Shin, S.-Y. Park, H.S. Kim, C.-Y. Park, C.W. Yang, J.-B. Yoo, M.H. Kwon, K. Ihm, H.-J. Song, T.-H. Kang, H.-J. Shin, Y.-J. Park, and J.-M. Kim J. Vac. Sci. Technol. B 23 2005 930
30. J.-H. Ting, T.-L. Li, and Y.-C. Hong J. Vac. Sci. Technol. B 24 2006 1794