In situ real-time monitoring of changes in the surface roughness during nonadiabatic optical near-field etching

Nanotechnology

Volumn 21, Issue 35, 2010, Pages

  Yatsui, T ^a   Hirata, K ^b   Tabata, Y ^b   Nomura, W ^a   Kawazoe, T ^a   Naruse, M ^a,c   Ohtsu, M ^a  

^a UNIVERSITY OF TOKYO   (Japan)

^b Sigma Koki Co Ltd   (Japan)

^c NATIONAL INSTITUTE OF INFORMATION AND COMMUNICATIONS TECHNOLOGY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFM IMAGE; CW-LASER; ETCHING PARAMETERS; IN-SITU; NEAR-FIELD; NON-ADIABATIC; OPTICAL NEAR FIELD; OPTIMIZATION CRITERIA; REAL TIME MONITORING; SCATTERED LIGHT; SELF-ORGANIZED; SILICA SUBSTRATE;

ETCHING; LIGHT SOURCES; METAL ANALYSIS; OPTIMIZATION; SILICA; SURFACE PROPERTIES;

SURFACE ROUGHNESS;

EID: 77957852861     PISSN: 09574484     EISSN: 13616528     Source Type: Journal    
DOI: 10.1088/0957-4484/21/35/355303     Document Type: Article

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