Realization of an ultra-flat silica surface with angstrom-scale average roughness using nonadiabatic optical near-field etching

Applied Physics B: Lasers and Optics

Volumn 93, Issue 1, 2008, Pages 55-57

  Yatsui, T ^a   Hirata, K ^b   Nomura, W ^a   Tabata, Y ^b   Ohtsu, M ^a,c  

^a UNIVERSITY OF TOKYO   (Japan)

^b Sigma Koki Co Ltd   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHLORINE COMPOUNDS; ETCHING; SILICATE MINERALS; SILICON COMPOUNDS;

NON ADIABATIC; NON-ADIABATIC PROCESSES; OPTICAL NEAR FIELDS; SILICA SUBSTRATES; SILICA SURFACES;

SILICA;

EID: 51949093868     PISSN: 09462171     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00340-008-3142-z     Document Type: Article

References (7)

1. B. Wua, A. Kumar, J. Vac. Sci. Technol. B 25, 1743 (2007)
2. L.M. Cook, J. Non-Cryst. Solids 120, 152 (1990)
3. T. Kawazoe, K. Kobayashi, S. Takubo, M. Ohtsu, J. Chem. Phys. 122, 024715 (2005)
4. K. Kobayashi, T. Kawazoe, M. Ohtsu, IEEE Trans. Nanotechnol. 4, 517 (2005)
5. T. Kawazoe, Y. Yamamoto, M. Ohtsu, Appl. Phys. Lett. 79, 1184 (2001)
6. R. Kullmer, D. Bäuerle, Appl. Phys. A 43, 227 (1987)
7. T. Izawa, N. Inagaki, Proc. IEEE 68, 1184 (1980)