Synthesis and surface characterization of ordered mesoporous silica SBA-15

Materials Chemistry and Physics

Volumn 124, Issue 2-3, 2010, Pages 1248-1252

  Kokunesoski M ^a   Gulicovski, J ^a   Matovic B ^a   Logar, M ^b   Milonjic S K ^a   Babic B ^a  

^a UNIVERSITY OF BELGRADE   (Serbia)

^b Faculty of Mining and Geology   (Serbia)

Author keywords

Amorphous materials; Nanostructures; Surface properties

Indexed keywords

ACIDIC CONDITIONS; DILUTE SOLUTION; FOURIER TRANSFORMED INFRARED SPECTROSCOPY; HEATING TEMPERATURES; HIGHER TEMPERATURES; ISO-ELECTRIC POINTS; MESOPOROSITY; MICROPORES; NITROGEN ADSORPTION-DESORPTION; NONIONIC; ORDERED MESOPOROUS SILICAS; PARTICLE DIAMETERS; PLURONICS; POINT OF ZERO CHARGE; REACTION SOLUTIONS; SBA-15 MATERIALS; SPECIFIC SURFACE; SURFACE CHARACTERIZATION; SYNTHESIS CONDITIONS; TRIBLOCK COPOLYMERS; ZERO CHARGE;

BLOCK COPOLYMERS; DESORPTION; GAS ADSORPTION; INFRARED SPECTROSCOPY; MESOPOROUS MATERIALS; NANOSTRUCTURES; NITRIC ACID; PORE SIZE; SILICA; SURFACE PROPERTIES; SYNTHESIS (CHEMICAL);

AMORPHOUS MATERIALS;

EID: 77957838762     PISSN: 02540584     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.matchemphys.2010.08.066     Document Type: Article

References (47)

1. T. Yanagisawa, T. Shimizu, K. Kuroda, and C. Kato Bull. Chem. Soc. Jpn. 63 1990 988
2. J.S. Beck, J.C. Vartuli, W.J. Roth, M.E. Leonowicz, C.T. Kresge, K.D. Schmitt, C.T.-W. Chu, D.H. Olson, E.W. Sheppard, S.B. McCullen, J.B. Higgins, and J.L. Schlenkert J. Am. Chem. Soc. 114 1992 10834
3. B.G. Trewyn, I.I. Slowing, S. Giri, H.T. Chen, and V.S.-Y. Lin Acc. Chem. Res. 40 2007 846
4. D. Zhao, J. Feng, Q. Huo, N. Melosh, G.H. Fredrickson, B.F. Chmelka, and G.D. Stucky Science 279 1998 548
5. D. Zhao, Q. Huo, J. Feng, B.F. Chmelka, and G.D. Stucky J. Am. Chem. Soc. 120 1998 6024
6. P. Yang, D. Zhao, D.I. Margolese, B.F. Chmelka, and G.D. Stucky Nature 396 1998 152
7. P. Yang, D. Zhao, D.I. Margolese, B.F. Chmelka, and G.D. Stucky Chem. Mater. 11 1999 2813
8. M. Kruk, and M. Jaroniec Chem. Mater. 12 2000 1961
9. M. Imperior-Clerc, P. Davidson, and A. Davidson J. Am. Chem. Soc. 122 2000 11925
10. R. Ryoo, C.H. Ko, M. Kruk, V. Antoschshuk, and M. Jaroniec J. Phys. Chem. B 104 2000 11456
11. C.G. Sonwane, and P.J. Ludovice J. Mol. Catal. A: Chem. 238 2005 135
12. K. Lee, D. Lee, H. Lee, C.K. Kim, Z. Wu, and K. Lee Korean J. Chem. Eng. 27 2010 1333
13. M. valet-Regi, F. Balas, and D. Arcos Angew. Chem. Int. Ed. 46 2007 7548
14. M. Manzano, V. Aina, C.O. Arean, F. Balas, V. Cauda, M. Colilla, M.R. Delgado, and M. Vallet-Regi Chem. Eng. J. 137 2008 30
15. C.Y. Lai, B.G. Trewyn, D.M. Jeftinija, K. Jeftinija, S. Xu, S. Jeftinija, and V.S.Y. Lin J. Am. Chem. Soc. 125 2003 4451
16. K. Nozawa, A. Shoji, and M. Sugawara Supramol. Chem. 22 2010 389
17. Q. Meng, X. Zhang, C. He, G. He, P. Zhou, and C. Duan Adv. Funct. Mater. 20 2010 1903
18. A. Lapkin, B. Bozkaya, T. Mays, L. Borello, K. Edler, and B. Crittenden Catal. Today 81 2003 611
19. O.A. Anunziata, A.R. Beltramone, M.L. Martinez, and L. Lopez Belon J. Colloid Interface Sci. 315 2007 184
20. Z. Jin, X. Wang, and X. Cui J. Mater. Sci. 42 2007 465
21. S.W. Song, K. Hidajat, and S. Kawi Langmuir 21 2005 9568
22. Y. Chen, J. Han, and H. Zhang Appl. Surf. Sci. 253 2007 9400
23. A. Nieto, F. Balas, M. Collila, M. Manzano, and M. Vallet-Regi Micropor. Mesopor. Mater. 116 2008 4
24. G.D. Stucky, B.F. Chmelka, D. Zhao, N. Melosh, Q. Huo, J. Feng, P. Yang, D. Pine, D. Margolese, W. Lukens Jr., G.H. Fredrickson, P. Schmidt-Winkel, Block Copolymer Processing for Mesostructured Inorganic Oxide Materials, US Patent, 6,592,764 (July 15, 2003).
25. E.P. Barret, L.G. Joyner, and P.P. Halenda J. Am. Chem. Soc. 73 1951 373
26. K. Kaneko, C. Ishii, M. Ruike, and H. Kuwabara Carbon 30 1992 1075
27. M. Kruk, M. Jaroniec, and K.P. Gadakaree J. Colloid Interface Sci. 192 1997 250
28. K. Kaneko, C. Ishii, H. Kanoh, Y. Hanzawa, N. Setoyama, and T. Suzuki Adv. Colloid Interface Sci. 76-77 1998 295
29. S.K. Milonjić, A. Ruvarac, and M. Šušić Termochim. Acta 11 1975 261
30. K.S.W. Sing, D.H. Everett, R.A.W. Haul, L. Moscou, R.A. Pierotti, and J. Rouquerol Pure Appl. Chem. 57 1985 603 (dodati ostale autore)
31. A. Burneau, O. Barres, J.P. Gallas, and J.C. Lavalley Langmuir 6 1990 1346
32. J.P. Gallas, and J.C. Lavalley Langmuir 7 1991 1235
33. K.C. Vrancken, P. van Der Voort, I. Gillis D'Hamers, E.F. Vansant, and P.J. Grobet J. Chem. Faraday Trans. 88 1992 3197
34. S.V. Nitta, V. Pisupatti, A. Jain, P.C. Wayner, W.N. Gill, and J.L. Plawsky Vac. Sci. Technol. B 17 1999 205
35. S.K. Milonjić, Lj. Čerović, Dj.M. Čokeša, and S. Zec J. Colloid Interface Sci. 309 2007 155
36. T.X. Bui, and H. Choi J. Hazard. Mater. 168 2009 602
37. L. Jiao, and J.R. Regalbuto J. Catal. 260 2008 342
38. M. Szekeres, I. Dekany, and A. de Keizer Colloids Surf. A 141 1998 327
39. J.A. Schwarz, C.T. Driscoll, and A.K. Bhanot J. Colloid Interface Sci. 97 1984 55
40. E. Matijević A.V. Delgado, Interfacial Electrokinetics and Electrophoresis 2000 Derkker New York 199
41. M. Kosmulski, and E. Matijević Langmuir 8 1992 1060
42. G.A. Parks Chem. Rev. 65 1965 177
43. S.M. Ahmed J.W. Diggle, Oxide and Oxide Films vol. II 1973 Dekker New York 319
44. M. Kosmulski Chemical Properties of Material Surfaces 2001 Dekker New York p. 65
45. M. Kosmulski J. Colloid Interface Sci. 253 2002 77
46. M. Kosmulski J. Colloid Interface Sci. 275 2004 214
47. T. Jesionowski Colloid Surf. A 222 2003 87