Explanation for the appearance of alumina nanoparticles in a cold wall Atomic Layer Deposition system and their characterization

Vacuum

Volumn 85, Issue 3, 2010, Pages 368-372

  Philip, Anu ^a   Thomas, Subin ^a   Kumar, K Rajeev ^a  

^a Department of Physics   (India)

Author keywords

ALD; Alumina; Nanoparticle

Indexed keywords

ALD; ALUMINA NANOPARTICLE; ALUMINA THIN FILMS; ATOMIC LAYER; COLD WALL; DIELECTRIC CONSTANTS; DIELECTRIC STUDIES; FTIR; MECHANISM OF FORMATION; SEM; SORPTION MECHANISM; SPHERICAL SHAPE; SURFACE AREA; SURFACE ENERGIES; SYNTHESIZED PARTICLES; TRIMETHYL ALUMINUMS; XRD;

ALUMINUM; ATOMIC LAYER DEPOSITION; CHEMISORPTION; DEPOSITION; INTERFACIAL ENERGY; NANOPARTICLES; PELLETIZING; PHYSISORPTION; SURFACE CHEMISTRY; THERMOANALYSIS;

ALUMINUM COATINGS;

EID: 77957751033     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2010.07.010     Document Type: Article

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