Magnetic characterization of micropatterned Nd-Fe-B hard magnetic films using scanning Hall probe microscopy

Journal of Applied Physics

Volumn 108, Issue 6, 2010, Pages

  Kustov, M ^a,b   Laczkowski, P ^a   Hykel, D ^a   Hasselbach, K ^a   Dumas Bouchiat, F ^a   O'Brien, D ^a   Kauffmann, P ^b   Grechishkin, R ^c   Givord, D ^a   Reyne, G ^b   Cugat, O ^b   Dempsey, N M ^a  

^a LABORATOIRE DE CRISTALLOGRAPHIE   (France)

^b Electrical Engineering Laboratory   (France)

^c TVER STATE UNIVERSITY   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE VALUES; FIELD GRADIENT; FIELD VALUES; HARD MAGNETIC FILM; LAB-ON-CHIP; MAGNETIC CHARACTERIZATION; MAGNETIC PARTICLE; MEASURED FIELD; MICROMAGNETS; MICRON SCALE; MICROPATTERNED; ND-FE-B; NON DESTRUCTIVE; OUT-OF-PLANE; PATTERNED FILMS; QUANTITATIVE COMPARISON; QUANTITATIVE MEASUREMENT; REMANENT MAGNETIZATION; SCANNING HALL PROBE MICROSCOPY; SPATIAL VARIATIONS; STRAY MAGNETIC FIELDS;

MAGNETIC FIELDS; MAGNETIC FILMS; MAGNETS; METALLIC FILMS; NEODYMIUM; NEODYMIUM ALLOYS; PROBES; SUPERCONDUCTING MATERIALS;

MAGNETIZATION REVERSAL;

EID: 77957728553     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3486513     Document Type: Article

References (35)

1. J. Y. Park and M. G. Allen, J. Micromech. Microeng. JMMIEZ 0960-1317 8, 307 (1998). 10.1088/0960-1317/8/4/008
2. T. S. Chin, J. Magn. Magn. Mater. JMMMDC 0304-8853 209, 75 (2000). 10.1016/S0304-8853(99)00649-6 (Pubitemid 32211922)
3. J. W. Judy, Smart Mater. Struct. SMSTER 0964-1726 10, 1115 (2001). 10.1088/0964-1726/10/6/301 (Pubitemid 34050629)
4. O. Cugat, J. Delamare, and G. Reyne, IEEE Trans. Magn. IEMGAQ 0018-9464 39, 3607 (2003). 10.1109/TMAG.2003.816763
5. D. P. Arnold, IEEE Trans. Magn. IEMGAQ 0018-9464 43, 3940 (2007). 10.1109/TMAG.2007.906150
6. K. W. Oh and C. H. Ahn, Comprehensive Microsystems (Elsevier, New York, 2008), Vol. 2, p. 39
7. R. P. Allen, S. D. Dahlgren, H. W. Arrowsmith, and J. P. Heinrich, AFML Technical Report No. AFML-TR-74-87, 1974.
8. F. J. Cadieu, J. Vac. Sci. Technol. A JVTAD6 0734-2101 6, 1668 (1988). 10.1116/1.575305
9. F. J. Cadieu, in Physics of Thin Films, edited by, M. Francombe, and, J. Vossen, (Academic, New York, 1992), Vol. 16.
10. B. A. Kapitanov, N. V. Kornilov, Y. L. Linetsky, and V. Y. Tsvetkov, J. Magn. Magn. Mater. JMMMDC 0304-8853 127, 289 (1993). 10.1016/0304-8853(93)90045- 4
11. N. M. Dempsey, A. Walther, F. May, D. Givord, K. Khlopkov, and O. Gutfleisch, Appl. Phys. Lett. APPLAB 0003-6951 90, 092509 (2007). 10.1063/1.2710771 (Pubitemid 46355730)
12. A. Walther, K. Khlopkov, O. Gutfleisch, D. Givord, and N. M. Dempsey, J. Magn. Magn. Mater. JMMMDC 0304-8853 316, 174 (2007). 10.1016/j.jmmm.2007.02.047 (Pubitemid 46920613)
13. H. Lemke, T. Lang, T. Giiddenhenrich, and C. Heiden, J. Magn. Magn. Mater. JMMMDC 0304-8853 148, 426 (1995). 10.1016/0304-8853(94)01705-0
14. T. Budde and H. H. Gatzen, J. Appl. Phys. JAPIAU 0021-8979 99, 08N304 (2006). 10.1063/1.2176390
15. J. Zhang, Y. K. Takahashi, R. Gopalan, and K. Hono, J. Magn. Magn. Mater. JMMMDC 0304-8853 310, 1 (2007). 10.1016/j.jmmm.2006.07.017 (Pubitemid 46048575)
16. A. Walther, C. Marcoux, B. Desloges, R. Grechishkin, D. Givord, and N. M. Dempsey, J. Magn. Magn. Mater. JMMMDC 0304-8853 321, 590 (2009). 10.1016/j.jmmm.2008.09.028
17. F. Dumas-Bouchiat, L. F. Zanini, M. Kustov, N. M. Dempsey, R. Grechishkin, K. Hasselbach, J. C. Orlianges, C. Champeaux, A. Catherinot, and D. Givord, Appl. Phys. Lett. APPLAB 0003-6951 96, 102511 (2010). 10.1063/1.3341190
18. R. M. Grechishkin, S. Chigirinsky, M. Gusev, O. Cugat, and N. M. Dempsey, in Magnetic Nanostructures in Modern Technology, edited by, B. Azzerboni, G. Asti, L. Pareti, and, M. Ghidini, (Springer/Kluwer Academic, Dordrecht, 2007), pp. 195-224.
19. A. M. Chang, H. D. Hallen, L. Harriott, H. F. Hess, H. L. Kao, J. Kwo, R. E. Miller, R. Wolfe, J. van der Ziel, and T. Y. Chang, Appl. Phys. Lett. APPLAB 0003-6951 61, 1974 (1992). 10.1063/1.108334
20. A. Oral, S. J. Bending, and M. Henini, Appl. Phys. Lett. APPLAB 0003-6951 69, 1324 (1996). 10.1063/1.117582
21. R. B. Dinner, M. R. Beasley, and K. A. Moler, Rev. Sci. Instrum. RSINAK 0034-6748 76, 103702 (2005). 10.1063/1.2072438 (Pubitemid 41545694)
22. O. Kazakova, J. Gallop, G. Perkins, and L. Cohen, Appl. Phys. Lett. APPLAB 0003-6951 90, 162502 (2007). 10.1063/1.2724770 (Pubitemid 46644833)
23. S. Schnittger, S. Dreyer, Ch. Jooss, S. Sievers, and U. Siegner, Appl. Phys. Lett. APPLAB 0003-6951 90, 042506 (2007). 10.1063/1.2435592 (Pubitemid 46184654)
24. S. Chigirinsky, M. Kustov, N. Dempsey, C. Ndao, and R. Grechishkin, Rev. Adv. Mater. Sci. RAMSCX 1606-5131 20, 85 (2009).
25. D. O'Brien (unpublished).
26. A. Pross, A. I. Crisan, S. J. Bending, V. Mosser, and M. Konczykowski, J. Appl. Phys. JAPIAU 0021-8979 97, 096105 (2005). 10.1063/1.1887828 (Pubitemid 40682754)
27. The quantum well Hall sensors (QWHSs) based on AlGaAs/InGaAs/GaAs heterostructures were provided by V. Mosser of Itron SAS, France.
28. K. Hasselbach, C. Ladam, V. O. Dolocan, D. Hykel, T. Crozes, K. Schuster, and D. Mailly, J. Phys. Conf. Ser. 97, 012330 (2008). 10.1088/1742-6596/97/1/ 012330
29. E. M. Purcell, Electricity and Magnetism, Berkeley Physics Course Vol. II (McGraw-Hill, New York, 1986).
30. R. M. Grechishkin, L. E. Afanasieva, Y. G. Pastushenkov, and N. N. Maksimov, Meas. Sci. Technol. MSTCEP 0957-0233 5, 853 (1994). 10.1088/0957-0233/5/7/016
31. N. Takahashi, K. Akiyama, H. Kato, and K. Kishi, COMPEL: The International Journal of Computation and Mathematics in Electrical and Electronic Engineering 0332-1649 27, 144 (2008). 10.1108/03321640810836717
32. M. A. M. Gijs, Microfluidic Technologies for Miniaturized Analysis Systems (Springer, USA, 2007), pp. 241-274. 10.1007/978-0-387-68424-6-6
33. I. F. Lyuksyutov, D. G. Naugle, and K. D. D. Rathnayaka, Appl. Phys. Lett. APPLAB 0003-6951 85, 1817 (2004). 10.1063/1.1781735
34. M. Fŕńa-Robin, H. Chetouani, N. Haddour, H. Rostaing, J. Lafor̂t, and G. Reyne, 30th IEEE EMBS Annual International Conference, Vancouver, BC, Canada, 20-25 August 2008 (IEEE, New York, 2008), pp. 3360-3363.
35. R. I. Joseph and E. Schlomann, J. Appl. Phys. JAPIAU 0021-8979 36, 1579 (1965). 10.1063/1.1703091