Investigations of the optical absorption spectra of porous silicon layers on the Silicon backing by the nondestructive photoacoustic method

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 394-398

  Maliński, Mirosław ^a   Chrobak, Łukasz ^a   Bychto, Leszek ^a   Okupski, Tomasz ^a  

^a KOSZALIN UNIVERSITY OF TECHNOLOGY   (Poland)

Author keywords

Non destructive testing; Photoacoustic methods; Porous silicon; Semiconductors

Indexed keywords

CRYSTALLINE SILICONS; NON DESTRUCTIVE; NON DESTRUCTIVE TESTING; OPTICAL ABSORPTION BANDS; OPTICAL ABSORPTION COEFFICIENTS; OPTICAL ABSORPTION SPECTRUM; PHOTOACOUSTIC METHODS; PHOTOACOUSTIC SPECTRA; POROUS SILICON LAYERS; SEMICONDUCTORS; TWO LAYER MODEL;

ABSORPTION; ELECTROMAGNETIC WAVE ABSORPTION; NONDESTRUCTIVE EXAMINATION; NUMERICAL ANALYSIS; PHOTOACOUSTIC EFFECT; SEMICONDUCTING SILICON COMPOUNDS;

POROUS SILICON;

EID: 77957723191     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.08.095     Document Type: Article

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