SCOPUS 정보 검색 플랫폼

Volumn 519, Issue 1, 2010, Pages 101-105

Fabrication of nitrogen-doped mesoporous TiO2 layer with higher visible photocatalytic activity by plasma-based ion implantation

(5) Jinlong, Li a,b Xinxin, Ma b Mingren, Sun b Li, Xiaomin c Zhenlun, Song a

a NINGBO INSTITUTE OF MATERIALS TECHNOLOGY AND ENGINEERING (China)

b HARBIN INSTITUTE OF TECHNOLOGY (China)

c INSTITUTE OF GEOLOGY AND GEOPHYSICS (China)

Author keywords

Ion implantation; Photocatalysis; Structure; Titanium oxide

Indexed keywords

ARGON ION; COMPACT LAYER; FRESH SURFACES; HELIUM BUBBLES; IMPLANTED LAYERS; MESO-PORES; MESOPOROUS; MESOPOROUS TIO; NITROGEN-DOPED; NITROGEN-DOPING; PHOTOCATALYTIC ACTIVITIES; PHOTODEGRADATION RATE; PHOTORESPONSES; PLASMA-BASED ION IMPLANTATION; POROUS TIO; POSTIMPLANTATION ANNEALING; RHODAMINE B; STRUCTURE; SUB-SURFACES; TITANIUM SUBSTRATES; VISIBLE LIGHT; VISIBLE LIGHT ABSORPTION; VISIBLE LIGHT REGION;

ARGON; DOPING (ADDITIVES); HELIUM; LIGHT SOURCES; NITROGEN; OXIDE MINERALS; PHOTOCATALYSIS; PHOTODEGRADATION; SPUTTERING; SURFACE STRUCTURE; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES;

ION IMPLANTATION;

EID: 77957712679 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2010.07.070 Document Type: Article

Times cited : (24)

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