Ion implantation and annealing for an efficient N-doping of TiO2 nanotubes

Nano Letters

Volumn 6, Issue 5, 2006, Pages 1080-1082

  Ghicov, Andrei ^a   Macak, Jan M ^a   Tsuchiya, Hiroaki ^a   Kunze, Julia ^a   Haeublein, Volker ^b   Frey, Lothar ^b   Schmuki, Patrik ^a  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CRYSTALLINE MATERIALS; ELECTROCHEMISTRY; ENZYMES; HEAT TREATMENT; ION BOMBARDMENT; ION IMPLANTATION; TITANIUM DIOXIDE;

PHOTOCONVERSION EFFICIENCY; PHOTOCURRENT RESPONSE; PHOTOELECTROCHEMICAL MEASUREMENTS; TITANIA NANOTUBE LAYERS;

NANOTUBES;

EID: 33744812179     PISSN: 15306984     EISSN: None     Source Type: Journal    
DOI: 10.1021/nl0600979     Document Type: Article

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