High sheet resistance, low temperature coefficient of resistance resistor films for integrated circuits

Journal of Vacuum Science and Technology B

Volumn 28, Issue 4, 2010, Pages 835-840

  Wright, S W ^a   Judge, C P ^a   Lee, M J ^a   Bowers, D F ^b   Dunbar, M ^b   Wilson, C D ^b  

^a IMPERIAL COLLEGE LONDON   (United Kingdom)

^b ANALOG DEVICES INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

RESISTORS; SHEET RESISTANCE; SILICA; TEMPERATURE; THIN FILM CIRCUITS; THIN FILMS; TIMING CIRCUITS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

HIGH RESISTANCE; HIGH-SHEET-RESISTANCE; LOW TEMPERATURE COEFFICIENTS; MATERIAL SYSTEMS; POST DEPOSITION ANNEALING; R.F. SPUTTERING; RESISTANCE COEFFICIENTS; RF-SPUTTERING; TEMPERATURE COEFFICIENTS OF RESISTANCE; THIN FILM RESISTORS;

SPECTROSCOPIC ANALYSIS;

EID: 77957227222     PISSN: 21662746     EISSN: 21662754     Source Type: Journal    
DOI: 10.1116/1.3466531     Document Type: Conference Paper

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