Controlled sputtering enables better SiCr films

Semiconductor International

Volumn 23, Issue 12, 2000, Pages 181-182,-184

  Felmetsger, Valery V ^a,b,c  

^a Sputtered Films Inc   (United States)

^b INSTITUTE OF HIGH CURRENT ELECTRONICS   (Russian Federation)

^c Metal Ceramics Instrumentation   (Russian Federation)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE MEASUREMENT; HIGH TEMPERATURE PROPERTIES; MAGNETRON SPUTTERING; RESISTORS; SILICON COMPOUNDS; SILICON WAFERS; THIN FILM DEVICES; THIN FILMS;

SHEET RESISTANCE; SILICON CHROMIUM; TEMPERATURE COEFFICIENT OF RESISTANCE; THIN FILM RESISTORS;

SPUTTER DEPOSITION;

EID: 6744237785     PISSN: 01633767     EISSN: None     Source Type: Journal    
DOI: None     Document Type: Article

References (2)

1. Thin Film Precision Technology, Vishay Intertechnology Inc., www.vishay.com/ brands/thin_film/tech_guide html
2. Fan Wu, A.W McLaurin, K.E Henson, D.G. Managhan, S.L. Thomasson, Thin Solid Films, 332 (1998) 418-422