The improved electromechanical sensitivity of polymer thin films containing carbon clusters produced in situ by irradiation with metal ions

Carbon

Volumn 48, Issue 15, 2010, Pages 4230-4237

  Murugaraj, Pandiyan ^a   Mainwaring, David ^a   Khelil, Nurra Ali ^a   Peng, Ju Lin ^a   Siegele, Rainer ^b   Sawant, Prashant ^a  

^a RMIT UNIVERSITY   (Australia)

^b AUSTRALIAN NUCLEAR SCIENCE AND TECHNOLOGY ORGANISATION   (Australia)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED STRAIN; BASAL LAYER; BEAM DIRECTION; BEAM IRRADIATED POLYIMIDE; ELECTRICAL RESISTANCES; GAP DISTRIBUTION; GAS FLOWS; GAUGE FACTORS; GRAPHITIC LAYERS; GRAPHITIC STRUCTURES; IN-SITU; LOCAL SURFACES; NANO CHANNELS; NARROW DISTRIBUTION; POLYIMIDE MATRIX; POLYMER THIN FILMS; PREFERENTIAL ORIENTATION; SELECTED AREA ELECTRON DIFFRACTION; TUNNEL GAPS; VOLATILE GAS;

ATOMIC FORCE MICROSCOPY; CARBON CLUSTERS; CARBON FILMS; CARBON NANOTUBES; COPPER; ELECTRON ENERGY LOSS SPECTROSCOPY; ENERGY DISSIPATION; ION BEAMS; IRRADIATION; METAL IONS; PARALLEL FLOW; POLYIMIDES; POLYMER FILMS; POLYMERIC FILMS;

HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY;

EID: 77957147483     PISSN: 00086223     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.carbon.2010.07.026     Document Type: Article

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