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Volumn 604, Issue 21-22, 2010, Pages

Photo-induced site-specific nitridation of plasma-deposited B 10C2Hx films: A new pathway toward post-deposition doping of semiconducting boron carbides

(6) Behera, Swayambhu a Wilks, Justin a Dowben, Peter A b Driver, M Sky c Caruso, A N c Kelber, Jeffry A a

a UNIVERSITY OF NORTH TEXAS (United States)

b UNIVERSITY OF NEBRASKA LINCOLN (United States)

c UNIVERSITY OF MISSOURI KANSAS CITY (United States)

Author keywords

Ammonia; Amorphous thin films; Borides; Carbides; Photochemistry; Photoelectron spectroscopy; X ray photoelectron spectroscopy

Indexed keywords

AMORPHOUS THIN FILMS; BOND FORMATION; BORON ATOM; BORON CARBIDE FILMS; CARBON ATOMS; CORE-LEVEL PHOTOEMISSION; DEPOSITION PROCESS; DIFFUSION LIMITED; DOPANT IMPURITIES; DOPANT INCORPORATION; DOPANT SPECIES; PHOTO-INDUCED; PHOTOCHEMISTRY; POST-DEPOSITION; SITE-SPECIFIC; VACUUM ULTRAVIOLETS;

AMMONIA; AMORPHOUS FILMS; ATOMS; BORIDES; BORON CARBIDE; CHEMICAL REACTIONS; DOPING (ADDITIVES); EMISSION SPECTROSCOPY; MULTIPHOTON PROCESSES; PHOTOELECTRICITY; PHOTOELECTRONS; PHOTONS; SEMICONDUCTING FILMS; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY; X RAYS;

SEMICONDUCTING BORON;

EID: 77957116032 PISSN: 00396028 EISSN: None Source Type: Journal
DOI: 10.1016/j.susc.2010.07.023 Document Type: Article

Times cited : (13)

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